2004
DOI: 10.1016/j.nimb.2003.08.025
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Controlled fabrication of Mo-seeded Si microcones by Ar+-ion bombardment

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Cited by 30 publications
(23 citation statements)
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“…The fabrication method of ZnO nanoneedles are described in detail elsewhere [4,11]. In brief, after coating ZnO films with carbon films, they were ion-irradiated with 3 keV Ar + or N þ 2 ions at room temperature in a nanostructure fabrication system consisting of a microbeam (380 lm in diameter) ion gun (JEOL; MIED) and a particle supply source (arc plasma gun; ULVAC; APG-1000) [9,13,14]. The ion-incidence angle was 55°from the normal to the surface.…”
Section: Methodsmentioning
confidence: 99%
See 1 more Smart Citation
“…The fabrication method of ZnO nanoneedles are described in detail elsewhere [4,11]. In brief, after coating ZnO films with carbon films, they were ion-irradiated with 3 keV Ar + or N þ 2 ions at room temperature in a nanostructure fabrication system consisting of a microbeam (380 lm in diameter) ion gun (JEOL; MIED) and a particle supply source (arc plasma gun; ULVAC; APG-1000) [9,13,14]. The ion-incidence angle was 55°from the normal to the surface.…”
Section: Methodsmentioning
confidence: 99%
“…Since 1D ZnO nanomaterials have conventionally been synthesized from gas phase at growth temperatures usually higher than 500°C, the low-temperature process of the ion-irradiation method is quite fascinating. In addition, a simultaneous supply of the third element different from sample-composing elements during sputtering [9,13,14] as well as sputtering with a variety of ion species is possible in this ion-irradiation method. In what follows, we challenged the low-temperature fabrication by the ''advanced'' ion-irradiation method and wavelength-tuned random lasing of Fe-and N-doped 1D ZnO nanoneedles.…”
Section: Introductionmentioning
confidence: 99%
“…The carbon-coated samples were then irradiated with 3 keV Ar + ions (JEOL; MIED) focused into a microbeam 380 lm in diameter in an ultra-high vacuum chamber (JEOL; JAMP-10 S) [10,12]. The incidence angle of the ion beam was 55°from the normal to the surface.…”
Section: Methodsmentioning
confidence: 99%
“…Recently, we constructed a microprotrusion fabrication system ͓ultrahigh vacuum ͑UHV͒ operation͔ consisting of a differentially pumped ion gun and a seed-material supply source, whose etching and deposition rates are independently controllable, 10 and have launched the systematic experiments on surface modification by ion bombardment for a C-Mo system. In these experiments, we found that oblique Ar ϩ ion bombardment with a simultaneous Mo supply induces roomtemperature growth of linear and curved CNFs on a glassy carbon surface, on which no CNF formation has been reported so far.…”
mentioning
confidence: 99%
“…10 The ion gun and the arc-plasma gun, both of which operate under an UHV ambient, are located on the same X -Z plane, with their incidence angles at 55°from the normal to the surface ͑Fig. 1͒.…”
mentioning
confidence: 99%