Controlled crystallite orientation in ZnO nanorods prepared by chemical bath deposition: Effect of H2O2

Gurav, K.V.; Patil, Umakant M.; Pawar, S.M.; Kim, J.H.; Lokhande, C.D.

doi:10.1016/j.jallcom.2011.04.094

Cited by 36 publications

(20 citation statements)

References 19 publications

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“…Chemical bath deposition (CBD) is a soft chemical method used to deposit thin films from aqueous solution, with advantages such as low processing temperature, allowing growth on a variety of substrates, and easy adaptation to large area processing with low fabrication cost [17]. Thus this method has been preferred option over the expensive methods.…”

Section: Introductionmentioning

confidence: 99%

Morphology evolution of ZnO thin films from aqueous solutions and their application to liquefied petroleum gas (LPG) sensor

Gurav

Patil

Shin

et al. 2012

Journal of Alloys and Compounds

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Section: Introductionmentioning

confidence: 99%

Morphology evolution of ZnO thin films from aqueous solutions and their application to liquefied petroleum gas (LPG) sensor

Gurav

Patil

Shin

et al. 2012

Journal of Alloys and Compounds

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“…21 Zinc oxide is a non toxic direct wide-bandgap (3.3 eV) transparent semiconductor material widely used in the fields of chemical sensors, piezoelectric transducers, light emitting devices, photosensors and photovoltaic cells. 22 ZnO thin films can be deposited by several techniques such as sputtering, 23 pulsed laser deposition, 24,25 spray pyrolysis, 26 chemical bath deposition, 27 and electrodeposition, [28][29][30][31] the latter being the simplest. A variety of morphologies has been obtained depending on the used technique and conditions.…”

mentioning

confidence: 99%

Electrodeposition Growth of Oriented ZnO Deposits in Ionic Liquid Media

Tułodziecki

Tarascon

Taberna

et al. 2012

J. Electrochem. Soc.

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ZnO is a material of great interest for microelectronics because it offers a panel of attractive physical properties. It has been grown for decades as thin films from a wide variety of physical-chemical deposition techniques, most of them leading to films oriented with the polar direction perpendicular to the substrate. Here we report the electrodeposition of ZnO in ionic liquids (EMImTFSI (1-ethyl-3methylimidazolium bis(trifluoromethylsulfonyl)imide), BMPTFSI (1-Butyl-1-Methylpyrrolidinium bis(trifluoromethylsulfonyl)imide) or BMImTf (1-butyl-3-methylimidazolium trifluoromethanesulfonate)), together with the feasibility of manipulating the growth orientation of the ZnO deposits by adding the proper co-solvent to ionic liquid. We establish solvent dielectric constant as a key parameter to tailor the deposit growth direction. Moreover, via the use of Electrochemical Quartz Crystal Microbalance (EQCM) measurements, we determine the importance of the competition between Zn 2+ and O 2 reduction to properly trigger the transport phenomena leading to the growth of ZnO. This work provides insight which can be implemented to the growth of other binary and ternary oxides deposits in ionic liquid media, a field still poorly explored.

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“…7a) are fitted by two peaks, whereas the O1s spectra are fitted to four peaks. The Zn2p 3/2 lines for ZnO are quoted at 1021.44 eV with the O1s for ZnO found at 530.21 eV (Table 2) [22,23].…”

Section: Resultsmentioning

confidence: 99%

“…For deposition of ZnO various physical and chemical methods, such as RF magnetron sput-tering [10,11], spray pyrolysis [12,13], chemical vapour deposition (CVD) [14], metal organic chemical vapour deposition (MOCVD) [5,15], sol-gel [16][17][18][19], chemical bath deposition (CBD) [20][21][22][23][24][25], successive ionic layer adsorption and reaction (SILAR) [20,[26][27][28] and atomic layer deposition (ALD) [29][30][31][32][33], have been used. Chemical methods are attractive because they are simple and do not require complicated expensive arrangements.…”

Section: Introductionmentioning

confidence: 99%

Formation of ZnO films using the SILAR method

Šimkūnaitė-Stanynienė¹,

Grincienė²,

Naruškevičius³

et al. 2019

chemija

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The thin ZnO films were deposited using the successive ionic layer adsorption and reaction (SILAR) method. The morphology, structure and composition of the thin ZnO films were examined using scanning electron microscopy (SEM), X-ray diffraction (XRD) and X-ray photoelectron spectroscopy (XPS). The optical properties of the thin ZnO layers, which were deposited onto glass substrates, were investigated using ultraviolet–visible spectrophotometry (UV/Vis). It was found that the optical properties of the ZnO films depend on the composition of anionic precursor solutions, which were used for deposition of the ZnO layers. Moreover, the highest band gap energy of 3.86 eV was obtained for the ZnO layer when the 0.026 mol l–1 Na2B4O7 + 0.002 mol l–1 KMnO4 solution was used as the anionic precursor solution for the deposition of ZnO layers.

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Controlled crystallite orientation in ZnO nanorods prepared by chemical bath deposition: Effect of H2O2

Cited by 36 publications

References 19 publications

Morphology evolution of ZnO thin films from aqueous solutions and their application to liquefied petroleum gas (LPG) sensor

Morphology evolution of ZnO thin films from aqueous solutions and their application to liquefied petroleum gas (LPG) sensor

Electrodeposition Growth of Oriented ZnO Deposits in Ionic Liquid Media

Formation of ZnO films using the SILAR method

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