Controllable Change of Photoluminescence Spectra of Silicone Rubber Modified by 193 nm ArF Excimer Laser

Abstract

Photoluminescence spectra of silicone rubber ([SiO(CH 3 ) 2 ] n ) photochemically modified by a 193 nm ArF excimer laser was found to be controllable. Compared with the modification in air, the photoluminescence spectra could be blueshifted by the modification in vacuum or the additional irradiation of ArF excimer laser in vacuum after the modification in air. To redshift, on the other hand, the additional irradiation of a 157 nm F 2 laser in air after the modification in air, the modification in oxygen gas, or the postannealing after the modification in oxygen gas was effective. The blue and redshifts of the photoluminescence were essentially due to the acceleration of reduction and oxidation reactions of silicone rubber, respectively, because the photoluminescence derives its origin from oxygen deficiency centers and peroxy centers of the silica structure in the modified silicone rubber. On the basis of the spectra changes, colorful light-guiding sheets made of silicone rubber under illumination of a 375 nm light-emitting diode were successfully fabricated for cellular phone use.

F2-laser-induced surface modification of iron thin films to obtain corrosion resistance

“…When we used a 193 nm ArF excimer laser (Coherent COMPexPro 110) for a complimentary experiment, instead of the F 2 laser, the Fe 3 O 4 layer was not formed on iron thin films. The same as in the case of silicone rubber and aluminum thin film, [11][12][13][14][15][16][17][18][19][20][21][22][23][24][25][26][27][28][29] to produce O( 1 D) atoms by the photodecomposition of O 2 molecules in air with the F 2 laser is essential for the present surface modification of iron thin film.…”

“…This work is based on our previous finding; i.e., silicone ([SiO(CH 3 ) 2 ] n ) rubber is photochemically modified into carbon-free silica (SiO 2 ) by F 2 laser irradiation. [11][12][13][14][15][16][17][18][19][20][21][22][23][24][25][26] The use of the F 2 laser is essential for accomplishing the photochemical reactions; active oxygen [O( 1 D)] atoms can be effectively obtained through the photodecomposition of O 2 molecules in air. The strong oxidation reaction can take place on the silicone rubber surface with the O( 1 D) atoms.…”

Fs-laser processing of polydimethylsiloxane

“…5,6 The use of laser radiation offers a useful approach to the processing and selective surface functionalization of silicone. In particular, UV nanosecond laser pulses (e.g., KrF, ArF, and F 2 ) are largely applied for fabrication of optical elements, 7-9 deposition of thin films, 10-12 modification of optical properties, [13][14][15] and surface processing or functionalization. [16][17][18][19][20][21][22] For example, KrF excimer laser (k ¼ 248 nm) processing of siloxane-based flexible silicone rubber is used to photo-decompose the sample surface changing the surface relief.…”

F2-laser-induced micro/nanostructuring and surface modification of iron thin film to realize hydrophobic and corrosion resistant

“…11) This work is based on our previous finding i.e., silicone ([SiO(CH 3 ) 2 ] n ) rubber is photochemically modified into carbon-free silica (SiO 2 ) by F 2 laser irradiation. [12][13][14][15][16][17][18][19][20][21][22][23][24][25][26][27] The use of the F 2 laser is essential for accomplishing the photochemical reactions; moreover, active oxygen [O( 1 D)] atoms can be effectively obtained through the photodecomposition of O 2 molecules in air. A strong oxidation reaction can take place on the silicone rubber surface with O( 1 D) atoms.…”