Amorphous BaTiO 3 (a-BTO) thin films are deposited on p-Si(111) substrates by radio frequency (RF) magnetron sputtering without extra substrate heating. The microstructure of a-BTO thin films is modified by postannealing at low temperatures (260-600 C) in air. The results show that distorted TiO 6 octahedra exist in a-BTO thin films, and the degree of distortion decreases when the annealing temperature rises. The concentration of O vacancies in the TiO 6 of the thin films remains high when postannealed between 370 and 460 C, and a builtin electric field across the a-BTO/p-Si heterojunction is established in this annealing temperature range. This built-in electric field is regulated by controlling the concentration of O vacancies from the TiO 6 . The tunable C-V characteristic of the Au/a-BTO/p-Si metal-oxide-semiconductor (MOS) capacitor is obtained by modulating the built-in electric field at the heterojunction, and the flat band voltage of the MOS capacitor shifts from about À3 V to at least À13 V when the postannealing temperature increases from 260 to 420 C. This kind of tunable built-in electric field at the a-BTO/p-Si heterojunction, controlled by modifying the microstructure of amorphous oxide thin films, has never been observed before, which will be useful for MOS applications.