1997
DOI: 10.1063/1.118792
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Control of the growth and domain structure of epitaxial SrRuO3 thin films by vicinal (001) SrTiO3 substrates

Abstract: We report the effect of both miscut angle (α) and miscut direction (β) of vicinal substrates on the epitaxial growth and domain structure of isotropic metallic oxide SrRuO3 thin films. The thin films have been grown on vicinal (001) SrTiO3 substrates with α up to 4.1° and β up to 37° away from the in-plane [010] axis. Single-crystal epitaxial (110)o SrRuO3 thin films were obtained on vicinal SrTiO3 substrates with a large miscut angle (α=1.9°, 2.1°, and 4.1°) and miscut direction close to the [010] axis. Decre… Show more

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Cited by 122 publications
(82 citation statements)
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“…At the scan of SrRuO 3 ͑221͒ reflection, measured for 100 nm thick film, four peaks separated by 90°from each other were observed. This result, as shown before in PLD experiments, 27 indicates the coexistence of two orthorhombic SrRuO 3 domains with ͓110͔ axis normal to the substrate and two in-plane epitaxial arrangements of SrRuO 3 ͓001͔ ʈ SrTiO 3 ͓010͔ and SrRuO 3 ͓001͔ ʈ SrTiO 3 ͓100͔.…”
Section: Resultssupporting
confidence: 65%
See 1 more Smart Citation
“…At the scan of SrRuO 3 ͑221͒ reflection, measured for 100 nm thick film, four peaks separated by 90°from each other were observed. This result, as shown before in PLD experiments, 27 indicates the coexistence of two orthorhombic SrRuO 3 domains with ͓110͔ axis normal to the substrate and two in-plane epitaxial arrangements of SrRuO 3 ͓001͔ ʈ SrTiO 3 ͓010͔ and SrRuO 3 ͓001͔ ʈ SrTiO 3 ͓100͔.…”
Section: Resultssupporting
confidence: 65%
“…The best films, with a room temperature resistivity of about 150-300 ⍀ cm, root mean square ͑rms͒ roughness about 0.1 nm, and rocking curves with full width at half maximum ͑FWHM͒ lower than 0.1°, have been produced at temperatures of 640-800°C and oxygen pressures of 0.1-0.4 mbar. 11,26 Several other procedures, such as 90°o ff-axis sputtering 27 in temperature and pressure ranges of 300-680°C and 0.03-0.1 mbar, respectively, techniques requiring extremely low oxygen pressures ͑10 −6 -10 −3 mbar͒ such as magnetron sputtering, 28 ion beam sputtering, 12 or molecular beam epitaxy, 29 but also high pressure sputtering, 30 metal organic chemical vapor deposition, 31 or spin coating, 32 have been successfully applied. Most of them give results comparable to PLD.…”
Section: Introductionmentioning
confidence: 99%
“…If the step edges run only along SrTiO 3 [100] or [010] directions then a single domain SrRuO 3 layer is formed. On the other hand, if the step edges run along direction rotated by some angle from [100] or [010] directions, SrRuO 3 will attach to steps with its longer unit cell axis parallel to the steps resulting in twinned structure, due to the serrated nature of the step edge, as was already observed by Gan et al 9 SrRuO 3 layers on substrates with low miscut angles exhibit twinned structures due to large length of the substrate terraces as compared to the diffusion length of SrRuO 3, which results in island growth. In this regime SrRuO 3 tetragonal unit cell tends to align randomly along [100] and [010] directions of the SrTiO 3 substrate.…”
mentioning
confidence: 60%
“…1 The strong magnetocrystalline anisotropy in single-domain thin films 2,3 as well as crystals makes SrRuO 3 especially suitable for use in magnetic tunnel junctions, provided that single-domain heterostructures are achievable. 4,5 Furthermore, ferromagnetic SrRuO 3 has been used as a model system to study the initial growth, with special attention to surface termination and growth mode. 6 Because their application is mostly in mirror-symmetric trilayer junction configurations, growth control of the individual layers, as well as the atomic stacking sequence at the interfaces, is required.…”
mentioning
confidence: 99%