2019
DOI: 10.1007/s10800-019-01342-x
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Control of the adhesion strength between nickel replica and copper mold by electrochemical nucleation of lead

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Cited by 10 publications
(4 citation statements)
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“…3 it can be observed how from “High” to “Normal” there is an important change in the morphology of the microstructure, as lower current densities seem to lead towards more packed conical structures of lower overall dimensions as evidenced by the size of the crystallites. Then trend of roughness towards current density is in agreement with what is reported in the literature [ 34 , 35 ] for this range of current densities; hence the morphology should be addressed as the influencing factor of E act .
Fig.
…”
Section: Resultssupporting
confidence: 90%
“…3 it can be observed how from “High” to “Normal” there is an important change in the morphology of the microstructure, as lower current densities seem to lead towards more packed conical structures of lower overall dimensions as evidenced by the size of the crystallites. Then trend of roughness towards current density is in agreement with what is reported in the literature [ 34 , 35 ] for this range of current densities; hence the morphology should be addressed as the influencing factor of E act .
Fig.
…”
Section: Resultssupporting
confidence: 90%
“…As evident with film delamination in low current density prepared samples, wide distribution of larger nuclei likely results in unfavorable adhesion properties, which becomes an additional trend to mediate when designing electrodes or electrodeposition processes. 36 The findings shown here can be used to infer optimal process conditions for electrodeposition on non-planar or porous geometries. For a given geometry and desired tolerance, one can choose the appropriate Wa I (Fig.…”
Section: Resultsmentioning
confidence: 90%
“…The nickel mold is gradually separated from the original PVC mold with the action of vertical force F . The average value of release force F was recorded by the dynamometer, and the release strength was calculated by σ = F / L [N/cm] [15,33].…”
Section: Experiments Descriptionmentioning
confidence: 99%
“…One of the key technologies for replicating the mold is to control the mold release quality [15]. Lee et al studied the process of preparing a thick, electroformed micromold by using a KMPR (commodity manufactured by Kayaku Microchem Co. Ltd., Tokyo, Japan) negative tone photoresist, and microelectroforming was performed on the KMPR mold.…”
Section: Introductionmentioning
confidence: 99%