Extended Abstracts of the 2008 International Conference on Solid State Devices and Materials 2008
DOI: 10.7567/ssdm.2008.f-2-6l
|View full text |Cite
|
Sign up to set email alerts
|

Control of Sn Precipitation and Strain-relaxation in Compositionally Step-graded Ge<sub>1-x</sub>Sn<sub>x</sub> Buffer Layers for Tensile-strained Ge Layers

Help me understand this report

Search citation statements

Order By: Relevance

Paper Sections

Select...
1

Citation Types

0
2
0

Year Published

2015
2015
2015
2015

Publication Types

Select...
1

Relationship

0
1

Authors

Journals

citations
Cited by 1 publication
(2 citation statements)
references
References 0 publications
0
2
0
Order By: Relevance
“…Ge 12x2y Si x Sn y materials demonstrate high thermal stability far behind GeSn layers which show both phase separation and Sn precipitates for temperatures above 500 C rapid thermal annealing (RTA) [19,20].…”
Section: Part Two: Bandgap Engineering In Group IV Materials For Photmentioning
confidence: 99%
See 1 more Smart Citation
“…Ge 12x2y Si x Sn y materials demonstrate high thermal stability far behind GeSn layers which show both phase separation and Sn precipitates for temperatures above 500 C rapid thermal annealing (RTA) [19,20].…”
Section: Part Two: Bandgap Engineering In Group IV Materials For Photmentioning
confidence: 99%
“…20 Photon and phonon scattering in three subbands in a group IV material with indirect bandgap when laser pumped the subband 3. q32 and q21 stands for phonon momenta and h ω presents the phonon energy.…”
mentioning
confidence: 99%