Control of micro- and nanopatterns of octadecyltrimethoxysilane monolayers using nanoimprint lithography and atmospheric chemical vapor deposition

Ressier, Laurence; Martin, C.; Viallet, B.; Grisolia, J.; Peyrade, Jean-Pierre

doi:10.1116/1.2402144

Cited by 14 publications

(12 citation statements)

References 17 publications

(8 reference statements)

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“…If the surface energy of the protective glass is low, the surface becomes hydrophobic, and the dust and dirt can easily be washed off the protection glass by rain. The surface energy decreases through the introduction of moth-eye nano-patterns, and the surface becomes hydrophobic [6][7][8][9]. The surface becomes more hydrophobic and exhibits an excellent self-cleaning effect after it is coated with a trichloro-silane based self-assembled monolayer.…”

Section: Introductionmentioning

confidence: 99%

Anti‐reflection and hydrophobic characteristics of M‐PDMS based moth‐eye nano‐patterns on protection glass of photovoltaic systems

Shin

Han

Lee

2010

Progress in Photovoltaics

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To maximize the incident light, moth‐eye nano‐patterns were formed on a glass plate that was used as the protection glass for photovoltaic systems. These moth‐eye nano‐patterns were formed using a nano‐imprint lithography process and increased the transmittance of the glass plate by minimizing the reflection of light at the surface. After the formation of the moth‐eye nano‐patterns, the surface was coated with a trichloro‐silane based self‐assembled monolayer in order to create a hydrophobic surface because the hydrophobic surface induced a self‐cleaning effect. The transmittance of the glass plate increased from 91 to 94% at wavelength of 500 nm after the moth‐eye structure was introduced. Thus, the short circuit current (JSC) of the I–V characteristics and the charged capacity of the photovoltaic system increased up to 6% after replacing the conventional protection glass with the moth‐eye nano‐patterned glass. The durability of the moth‐eye nano‐patterns was evaluated with respect to an acidic environment, high temperatures and UV irradiation. From these evaluation results, the values of the transmittance and contact angle did not decrease after the nano‐patterns were soaked in sulfuric acid solutions with a pH of 2.0 for 48 h, exposed to a temperature of 120°C for 48 h, and irradiated 10 times with UV light for 4 h. Copyright © 2010 John Wiley & Sons, Ltd.

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Section: Introductionmentioning

confidence: 99%

Anti‐reflection and hydrophobic characteristics of M‐PDMS based moth‐eye nano‐patterns on protection glass of photovoltaic systems

Shin

Han

Lee

2010

Progress in Photovoltaics

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“…The first step of the process consists of functionalizing a silicon substrate with a hydrophobic self-assembled monolayer (SAM) of octadecyltrimethoxysilane (OTMS) by chemical vapor deposition (CVD) (Figure a). The experimental conditions used for this silanization, optimized in previous work, lead to a 2.3-nm-thick dense monolayer presenting a water contact angle of about 100°. The aim of this hydrophobic functionalization is to prevent nanoparticle deposition outside of the defined patterns.…”

Section: Methodsmentioning

confidence: 99%

Tunable Pyramidal Assemblies of Nanoparticles by Convective/Capillary Deposition on Hydrophilic Patterns Made by AFM Oxidation Lithography

et al. 2010

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Close-packed pyramidal assemblies of 100 nm latex nanoparticles were made by convective/capillary deposition on hydrophilic patterns created by oxidation lithography using atomic force microscopy (AFM). We demonstrated that the substrate temperature during convective/capillary assembly is a key experimental parameter in finely tuning the geometry of these pyramids and thus the total number of nanoparticles forming each 3D assembly. The volume and shape of these nanoparticle assemblies are discussed and compared to simulations.

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“…The anti-adhesive film created from C 4 F 8 /O 2 plasma exhibits enhanced mechanical stability and pattern transfer fidelity compared to that of CHF 3 /O 2 plasma during demolding cycles [ 78 ]. Self-assembled monolayer (SAM) films such as tridecafluoro-(1,1,2,2)-tetrahydrooctyl-trichlorosilane (F 13 -TCS) [ 67 ], (tridecafluoro-1,1,2,2-tetrahydrooctyl)trichlorosilane (TFS) [ 79 ], grafted octadecyltrimethoxysilane (OTMS) [ 80 ], and 1H,1H,2H,2H-perfluorodecyltrichlorosilane (FDTS) can also be utilized as a hydrophobic surfactant ( Figure 6 ) [ 24 , 70 , 71 ].…”

Section: Mold Surface Modificationsmentioning

confidence: 99%

Interfacial Interactions during Demolding in Nanoimprint Lithography

Chen

Luo

et al. 2021

Micromachines

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Nanoimprint lithography (NIL) is a useful technique for the fabrication of nano/micro-structured materials. This article reviews NIL in the field of demolding processes and is divided into four parts. The first part introduces the NIL technologies for pattern replication with polymer resists (e.g., thermal and UV-NIL). The second part reviews the process simulation during resist filling and demolding. The third and fourth parts discuss in detail the difficulties in demolding, particularly interfacial forces between mold (template) and resist, during NIL which limit its capability for practical commercial applications. The origins of large demolding forces (adhesion and friction forces), such as differences in the thermal expansion coefficients (CTEs) between the template and the imprinted resist, or volumetric shrinkage of the UV-curable polymer during curing, are also illustrated accordingly. The plausible solutions for easing interfacial interactions and optimizing demolding procedures, including exploring new resist materials, employing imprint mold surface modifications (e.g., ALD-assisted conformal layer covering imprint mold), and finetuning NIL process conditions, are presented. These approaches effectively reduce the interfacial demolding forces and thus lead to a lower defect rate of pattern transfer. The objective of this review is to provide insights to alleviate difficulties in demolding and to meet the stringent requirements regarding defect control for industrial manufacturing while at the same time maximizing the throughput of the nanoimprint technique.

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Control of micro- and nanopatterns of octadecyltrimethoxysilane monolayers using nanoimprint lithography and atmospheric chemical vapor deposition

Cited by 14 publications

References 17 publications

Anti‐reflection and hydrophobic characteristics of M‐PDMS based moth‐eye nano‐patterns on protection glass of photovoltaic systems

Anti‐reflection and hydrophobic characteristics of M‐PDMS based moth‐eye nano‐patterns on protection glass of photovoltaic systems

Tunable Pyramidal Assemblies of Nanoparticles by Convective/Capillary Deposition on Hydrophilic Patterns Made by AFM Oxidation Lithography

Interfacial Interactions during Demolding in Nanoimprint Lithography

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