2010
DOI: 10.1021/la1005852
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Tunable Pyramidal Assemblies of Nanoparticles by Convective/Capillary Deposition on Hydrophilic Patterns Made by AFM Oxidation Lithography

Abstract: Close-packed pyramidal assemblies of 100 nm latex nanoparticles were made by convective/capillary deposition on hydrophilic patterns created by oxidation lithography using atomic force microscopy (AFM). We demonstrated that the substrate temperature during convective/capillary assembly is a key experimental parameter in finely tuning the geometry of these pyramids and thus the total number of nanoparticles forming each 3D assembly. The volume and shape of these nanoparticle assemblies are discussed and compare… Show more

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Cited by 8 publications
(10 citation statements)
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“…With respect to the works of Fustin et al [44] and Viallet et al, [45] this is the first time that a selective arrangement of ordered particles has been extended onto hydrophilic stripes with a lateral dimension below 2 mm.…”
Section: Resultsmentioning
confidence: 86%
See 1 more Smart Citation
“…With respect to the works of Fustin et al [44] and Viallet et al, [45] this is the first time that a selective arrangement of ordered particles has been extended onto hydrophilic stripes with a lateral dimension below 2 mm.…”
Section: Resultsmentioning
confidence: 86%
“…Recently, Viallet et al obtained monolayers of colloidal particles at the edges of nanolithographically structured voids in silicon with a footprint 4 mm  4 mm. [45] In this paper, we report about the chemical patterning of OTS-SAMs by a laser-direct-write photothermal decomposition, achieving line features down to 0.5 mm, followed by a directed vertical deposition and slope-self-assembly of the colloidal polymer nanoparticles in the hydrophilic regions. This approach results in highly ordered colloidal stripes with widths below 10 mm as reported previously.…”
Section: Introductionmentioning
confidence: 99%
“…Self-assembled monolayers can be patterned using photolithography, 182,183 masked vapor deposition, 184 selective oxidation through a mask, 185 or atomic force microscopy oxidation lithography. 186 Selective wetting targets particle deposition on to particular domains. In the regions of particle deposition, thanks to capillary forces, highly ordered hexagonally close-packed domains self-assemble.…”
Section: Chemically Patterned Substratesmentioning
confidence: 99%
“…Self-assembled monolayers can be patterned using photolithography, 182,183 masked vapor deposition, 184 selective oxidation through a mask, 185 or atomic force microscopy oxidation lithography. 186 …”
Section: Using Patterned Substrates To Control Disordermentioning
confidence: 99%
“…With multi-functional molecules as the ink [5], the application potential of ALO has been more diversified than expected [6,7]. Herein, we report that a simple, effective chemical sensor can be constructed based on ALO and phenothiazines for the transduction of nicotinamide adenine dinucleotide (NAD + ) and its reduced form (NADH).…”
Section: Introductionmentioning
confidence: 99%