2006
DOI: 10.1063/1.2392960
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Continuous ultraviolet roll nanoimprinting process for replicating large-scale nano- and micropatterns

Abstract: With the increasing demand for large-scale nano- and micropatterns in the field of digital displays, nano- and micropattern replication technology has become a research priority. In this study, a continuous ultraviolet (UV) roll nanoimprinting process using a pattern roll stamper for the replication of large-scale nano- and micropatterns was designed and constructed. Several flexible nano- and micropatterns with large areas were fabricated and analyzed as tests of this continuous UV imprinting process.

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Cited by 104 publications
(80 citation statements)
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“…7 (III)) and two substrates (flexible substrate and rigid substrate, Fig. 7 (I)) can be used for the RNIL (Lan et al, 2008, Ahn et al, 2006, Ahn & Guo, 2008, Youn et al, 2008, Kao et al, 2005, Chang et al, 2006. Lan et al, have presented a general literature review on the RNIL (Lan et al, 2008).…”
Section: Roll Imprint Processmentioning
confidence: 99%
“…7 (III)) and two substrates (flexible substrate and rigid substrate, Fig. 7 (I)) can be used for the RNIL (Lan et al, 2008, Ahn et al, 2006, Ahn & Guo, 2008, Youn et al, 2008, Kao et al, 2005, Chang et al, 2006. Lan et al, have presented a general literature review on the RNIL (Lan et al, 2008).…”
Section: Roll Imprint Processmentioning
confidence: 99%
“…One is directly fabricating the micro/nano feature on the cylinder surface, using ultra-precision machining or other manufacturing method. [19] The other is to cover a shim stamper around the cylinder surface, in which the shim stamper is fabricated previously using electron beam lithography or other lithography technologies. [20] …”
Section: Fig 4 Schematic Diagrams Of the Uv-type Rnil System For Rimentioning
confidence: 99%
“…8 Ahn et al (2006) fabricated a continuous ultraviolet roll nanoimprint lithography system which achieved thickness uniformity while replicating large-scale nano-and micro-sized patterns. 9 The other is a thermal imprint lithography method which thermal imprint lithography uses the glass transition temperature to improve replication efficiency, because the Young's modulus of the polymer dramatically decreases near the glass transition region. Due to this merit, thermal imprint lithography has been widely applied to the fabrication of large area R2R or roll-to-plate (R2P) processes, which produce a high throughput in a continuous process with uniform quality.…”
Section: Introductionmentioning
confidence: 99%