Development of the Roll Type Incremental Micro Pattern Imprint System for Large Area Pattern Replication

Song, Jung‐Han; Lee, Hye-Jin; Lan, Shuhuai; Lee, Nak-Kyu; Lee, Geun-An; Lee, Tae-Jin; Choi, Sangchun; Bae, Sung Min

doi:10.1007/978-3-642-11598-1_11

Cited by 6 publications

(8 citation statements)

References 17 publications

(17 reference statements)

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“…P2P based 8 inch wafers can take 20,000 N of imprint force [ 157 ], however, the R2P method only needs 200 N for a 300 mm width imprint. Flexible polymer film based R2P methods were also introduced as shown in Figure 8 b [ 158 , 159 ]. They used the thermal NIL mechanism with a heated mold and roller.…”

Section: Printing Methodsmentioning

confidence: 99%

Scalable and High-Throughput Top-Down Manufacturing of Optical Metasurfaces

Lee

et al. 2020

Sensors

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Metasurfaces have shown promising potential to miniaturize existing bulk optical components thanks to their extraordinary optical properties and ultra-thin, small, and lightweight footprints. However, the absence of proper manufacturing methods has been one of the main obstacles preventing the practical application of metasurfaces and commercialization. Although a variety of fabrication techniques have been used to produce optical metasurfaces, there are still no universal scalable and high-throughput manufacturing methods that meet the criteria for large-scale metasurfaces for device/product-level applications. The fundamentals and recent progress of the large area and high-throughput manufacturing methods are discussed with practical device applications. We systematically classify various top-down scalable patterning techniques for optical metasurfaces: firstly, optical and printing methods are categorized and then their conventional and unconventional (emerging/new) techniques are discussed in detail, respectively. In the end of each section, we also introduce the recent developments of metasurfaces realized by the corresponding fabrication methods.

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Section: Printing Methodsmentioning

confidence: 99%

Scalable and High-Throughput Top-Down Manufacturing of Optical Metasurfaces

Lee

et al. 2020

Sensors

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“…This concept or technique is also observed in the work of Kim and the group [ 6 ]. Additionally, the roller may also be used to press a flexible polymer film onto the mold for imprinting via thermal NIL as observed in the work of Song et al [ 36 ] and Lim et al [ 37 ], as shown in Figures 5 and 6 . As the polymer film is pressed onto the heated mold using a roller, it becomes softened (or molten stage), where it will fill in the mold cavities under the given pressure.…”

Section: Reviewmentioning

confidence: 99%

A review of roll-to-roll nanoimprint lithography

et al. 2014

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Since its introduction in 1995, nanoimprint lithography has been demonstrated in many researches as a simple, low-cost, and high-throughput process for replicating micro- and nanoscale patterns. Due to its advantages, the nanoimprint lithography method has been rapidly developed over the years as a promising alternative to conventional nanolithography processes to fulfill the demands generated from the recent developments in the semiconductor and flexible electronics industries, which results in variations of the process. Roll-to-roll (R2R) nanoimprint lithography (NIL) is the most demanded technique due to its high-throughput fulfilling industrial-scale application. In the present work, a general literature review on the various types of nanoimprint lithography processes especially R2R NIL and the methods commonly adapted to fabricate imprint molds are presented to provide a clear view and understanding on the nanoimprint lithography technique as well as its recent developments.PACS81.16.Nd

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“…To overcome the issues, recent NIL development has tended to focus on roller-based NIL process, which is more advantageous as it requires low imprint force, yields higher throughput and better uniformity without the need for vacuum environment [13,15,16]. Its suitability for large area imprinting also observed the roller-based NIL processes being widely applied in industries for the fabrication of flexible electronics as seen in the work of Zang and Liang from SiPix Inc. [17], J-G. Kim [8].…”

Section: Introductionmentioning

confidence: 99%

“…However, the conventional NIL method using plate-to-plate (P2P) contact is not suitable for large area imprinting due to its high-force [12] and vacuum environment requirements [7,9], low throughput [13,14] and non-uniformity issues [15].…”

Section: Introductionmentioning

confidence: 99%

Development of a low cost roll-to-roll nanoimprint lithography system for patterning 8-inch wide flexible substrates

Mohamed

Kooy

Ibrahim

2014

IJNT

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Recent developments in flexible electronics, solar cells, displays, bio-chips and wearable technology have featured various micro/nanostructures in system designs. However, fabricating these micro/nanostructures on flexible substrates using existing technology such as photolithography, electron beam lithography (EBL) and other lithography techniques is troublesome, time consuming and costly. An in-house roll-to-roll ultraviolet nanoimprint lithography (R2R-UVNIL) system was designed and fabricated as an alternative low cost and large area patterning tool. It consists of a coating unit, soft-bake unit and imprinting unit which are connected together using a series of rollers. The aim of the integrated soft-bake stage was to minimise the mould sticking issues during the continuous R2R imprinting using solvent-based resist. The assembled R2R-UVNIL system was tested with imprinting process on an untreated commercial polyethylene terephthalate (PET) film as the flexible substrate, solvent-based SU8-2002 photopolymer as the resist and PDMS soft mould as the imprinting mould. The PDMS soft mould was replicated from an EBL patterned silicon master mould. Imprinting speeds of 50 to 150 mm/min have been achieved in this work, with relatively sound replication quality and formability for patterning sub-2 µm microstructures.

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Development of the Roll Type Incremental Micro Pattern Imprint System for Large Area Pattern Replication

Cited by 6 publications

References 17 publications

Scalable and High-Throughput Top-Down Manufacturing of Optical Metasurfaces

Scalable and High-Throughput Top-Down Manufacturing of Optical Metasurfaces

A review of roll-to-roll nanoimprint lithography

Development of a low cost roll-to-roll nanoimprint lithography system for patterning 8-inch wide flexible substrates

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