2020
DOI: 10.1016/j.rinp.2020.102939
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Contactless determination of doping concentration and resistivity of silicon wafers with cavity ring-down technique

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“…The doping concentration (Nd) is traditionally determined using the four-point probe method and eddy current mapping [34][35]. The four-point probe technique is used to determine resistivity here, while the hot point technique is used to determine the type of majority carriers for each produced layer.…”
Section: Electrical Propertiesmentioning
confidence: 99%
“…The doping concentration (Nd) is traditionally determined using the four-point probe method and eddy current mapping [34][35]. The four-point probe technique is used to determine resistivity here, while the hot point technique is used to determine the type of majority carriers for each produced layer.…”
Section: Electrical Propertiesmentioning
confidence: 99%