2016
DOI: 10.1016/j.sse.2016.07.011
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Contact resistance extraction methods for short- and long-channel carbon nanotube field-effect transistors

Abstract: Three different methods for the extraction of the contact resistance based on both the well-known transfer length method (TLM) and two variants of the Y-function method have been applied to simulation and experimental data of short-and long-channel CNTFETs. While for TLM special CNT test structures are mandatory, standard electrical device characteristics are sufficient for the Y-function methods. The methods have been applied to CNTFETs with low and high channel resistance. It turned out that the standard Y-f… Show more

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Cited by 26 publications
(21 citation statements)
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“…with (2 ) considering θch, is given by Rch,2 ][1+θch )(VGSVthnormalΔ/ ][β )(VGSVthnormalΔ (see (3 )), however, RC,2 is extracted in YFM 2 without using Rch,2. This approach, previously introduced for silicon‐based devices [20 ], has been adapted and successfully applied to other emerging transistor technologies [14 ] and use for the first time here for 2D FETs.…”
Section: Y‐function‐based‐methods For 2d Fetsmentioning
confidence: 99%
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“…with (2 ) considering θch, is given by Rch,2 ][1+θch )(VGSVthnormalΔ/ ][β )(VGSVthnormalΔ (see (3 )), however, RC,2 is extracted in YFM 2 without using Rch,2. This approach, previously introduced for silicon‐based devices [20 ], has been adapted and successfully applied to other emerging transistor technologies [14 ] and use for the first time here for 2D FETs.…”
Section: Y‐function‐based‐methods For 2d Fetsmentioning
confidence: 99%
“…the transfer length method (TLM) [5, 13 ]. An evaluation of the YFM extracted values accuracy is to evaluate the closeness of the considered ID model, including the extracted parameters [5, 12, 14 ] with the experimental data. This verification step has been either rarely provided in 2D FET technologies [6–11 ] or it has been considered for one single transfer curve at low fields of a specific technology [5 ].…”
Section: Introductionmentioning
confidence: 99%
“…Thus, the resistance measured is a linear combination (sum) of the contact resistance of the first contact and the second contact, and the sheet resistance of the CNT channel in-between the contacts (i.e. R Tot = 2R C + R Ch ) [83]. It is important to note that the metal resistance is negligibly much smaller than the contact resistance to be considered.…”
Section: Cnt/metal Interface Issues In Biofetsmentioning
confidence: 99%
“…Shorter channels contribute fewer scattering events, and thus, lower R Ch . In ohmic contacts with ballistic charge transport, the total resistance may approach the quantum limit of the nanotube; R Q = 6.5 k [32], [83]. For the measured total resistances of the variant lengths, the contact resistance is extrapolated by dragging back to L Ch = 0 in the transfer length plot, as illustrated in Fig.…”
Section: Cnt/metal Interface Issues In Biofetsmentioning
confidence: 99%
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