Conductive SPM probes of base Ti or W refractory compounds

Shevyakov, V. I.; Lemeshko, S; Roschin, V. M.

doi:10.1088/0957-4484/9/4/009

Cited by 13 publications

(7 citation statements)

References 7 publications

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“…Nowadays, various kinds of conductive probes have been studied including highly doped Si probes [19], carbon nanotube (CNT) probes [20][21][22], polymer graphite (PG) probes [23], and coated standard (Si or SiN) AFM probes [24][25][26][27][28][29][30][31][32]. Highly doped Si probes have relatively high conductivity and a sharp tip with curvature radii less than 10 nm.…”

Section: Introductionmentioning

confidence: 99%

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Batch Fabrication of Wear-Resistant and Conductive Probe with PtSi Tip

et al. 2021

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This paper presents a simple and reliable routine for batch fabrication of wear-resistant and conductive probe with a PtSi tip. The fabrication process is based on inductively coupled plasma (ICP) etching, metal evaporation, and annealing. Si tips with curvature radii less than 10 nm were produced with good wafer-level uniformity using isotropic etching and thermal oxygen sharpening. The surface roughness of the etched tip post was reduced by optimized isotropic etching. The dependence of the platinum silicide morphology on annealing conditions were also systematically investigated, and conductive and wear-resistant probes with PtSi tips of curvature radii less than 30 nm were batch fabricated and applied for scanning piezoelectric samples.

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Section: Introductionmentioning

confidence: 99%

“…The coated probes, with metals such as Ti, Au or Pt [24][25][26], with alloys such as TiN or PtSi, with doped diamond [28][29][30][31][32], are the most common conductive probes. However, wear resistances of these metal-coated probes are poor despite their good conductivities.…”

Section: Introductionmentioning

confidence: 99%

Batch Fabrication of Wear-Resistant and Conductive Probe with PtSi Tip

et al. 2021

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“…Since the fabrication techniques are derived from the integrated circuit industry, they are inherently batch oriented and it is possible to produce thousands of devices at a time. 6,7 However, in general, the demands of a STM tip may differ from those of the AFM probe, particularly in terms of geometry. Interesting applications include lithography and data storage.…”

Section: Introductionmentioning

confidence: 99%

Microfabrication of silicon tip structures for multiple-probe scanning tunneling microscopy

Bale

Palmer

2002

Journal of Vacuum Science &Amp; Technology B: Microelectronics and Nanometer Structures Processing, Measurement, and Phenomena

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We report the fabrication of arrays of silicon tips suitable for multiple-tip scanning tunneling microscopy applications (STM). We have produced silicon tips by reactive ion etching using only photoresist masks, removing the need for the extra processing required to produce oxide masks. These tips have been oxide-sharpened to reduce their radius of curvature to less than 10 nm. Metallic coating of the tips makes them suitable for STM measurements, by the addition of an appropriate metallic layer. The use of thick resist layers makes it possible to protect the tips during further processing such that they have been integrated on 20 μm mesa structures. Further patterning of thick resists over these structures enables individual contact to be made to the tips via lift-off. We have also produced single silicon tips suitable for STM by selecting individual tips from arrays. Images of grating structures shows these tips have well defined tip shape compared with STM tips produced by conventional methods, while atomic resolution STM measurements have also been obtained.

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“…Although TiN and other coatings are commercially available from cantilever manufacturers who have reported their properties, 1 we believe that researchers can benefit from the option of coating cantilever and tips themselves in order to engineer structures tailored to specific demanding applications. It is desirable to have a durable tip and, for many applications, a conductive probe is also desired so that a voltage can be applied between the tip and sample or so that the tip may be grounded to prevent charging.…”

Section: Introductionmentioning

confidence: 99%

Ti/TiN coatings for microfabricated cantilevers used in atomic force microscopy

Wiederhold

Yamaguchi

Ayala

et al. 2000

Journal of Vacuum Science &Amp; Technology B: Microelectronics and Nanometer Structures Processing, Measurement, and Phenomena

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Articles you may be interested inTi-Al-Si-N films for superhard coatings deposited by reactive cosputtering using Ti, Al, and Si targets Hardness enhancement by compositionally modulated structure of Ti/TiN multilayer films We report the successful sputter coating of microfabricated silicon cantilever and tip assemblies with high-quality titanium/titanium nitride ͑Ti/TiN͒ thin films using a technique that will be available to many researchers. We demonstrate that the use of pulsed mode reactive dc magnetron sputtering, adequate thermal budget, and careful control of a titanium seed layer were the key elements for producing usable coated cantilevers. This coating material takes advantage of the excellent adhesive properties of Ti with silicon and silicon oxide and the intrinsically hard and conductive properties of TiN. Hence, these coated cantilever and tip assemblies have promising advantages over standard cantilever and tip assemblies for many demanding atomic force microscopy applications. We were able to fabricate Ti/TiN coatings with negligible stress-induced bending of the delicate cantilevers. Tests to assess the performance of the Ti/TiN coatings were done on the tip assemblies and on sputter-coated blanket films on thermally oxidized silicon to obtain a measure of the film resistivity and thickness.

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Conductive SPM probes of base Ti or W refractory compounds

Cited by 13 publications

References 7 publications

Batch Fabrication of Wear-Resistant and Conductive Probe with PtSi Tip

Batch Fabrication of Wear-Resistant and Conductive Probe with PtSi Tip

Microfabrication of silicon tip structures for multiple-probe scanning tunneling microscopy

Ti/TiN coatings for microfabricated cantilevers used in atomic force microscopy

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