Computational study of sheath structure in chemically active plasmas

Abstract

Abstract.Results of computer simulations describing an interaction between a low-temperature multicomponent plasma and an immersed metal substrate are presented. For this purpose, computer model of volume processes in a DC glow discharge in Ar-O2 mixture and a particle model of plasma-solid interaction were created. The interaction is studied not only in case when a constant value of voltage bias on the immersed substrate is kept, but also when sinusoidal voltage bias is applied. A pressure dependence of the sheath region in electronegative plasma is shown, too.

Computer modelling of electronegative plasma sheaths and their mutual interaction

“…It is well known that the presence of more types of ions in plasma modifies both dynamic (Cerny et al 2008(Cerny et al , 2011 and static properties of sheaths (e.g. Marvi and Foroutan 2014)-its structure and stability.…”