Comprehensive Data Collection Device for Plasma Equipment Intelligence Studies

Abstract

In this study, various diagnostic tools were constructed and plasma factors measured to evaluate the intelligence of plasma process equipment. We used an ICP (Inductively Coupled Plasma) reactor with a radio frequency (RF) power of 13.56 MHz, a power of 400 to 800 W, and a pressure of 10 to 30 mTorr. Plasma parameters such as electron density (ne), electron temperature (Te), plasma potential (Vp), and floating potential (Vf) were measured using several instruments (VI probe and mass/energy analyzer, etc.) and subsequently analyzed. Regression analysis was performed to correlate the measured data with the plasma parameters. As a result, the plasma density (ne) and temperature (Te) were observed to be in good agreement with the non-invasive measurement results. In particular, the VI probes were highly correlated with almost all the measured plasma parameters. Therefore, the results of this study provide a basis for the estimation of plasma parameters using non-invasive measurement techniques.

A Study on the Characteristics of Inductively Coupled Plasma Nitridation Process

“…The process gas was N 2 (99.999% purity) and the flow rate and pressure were controlled using a mass flow controller (MFC, Mass-Flo ® , 1000sccm, MKS, Andover, MA, USA). The reactor base pressure was 10 −6 Torr, which was maintained using a turbomolecular pump (STP-1303C, Edwards, Burgess Hill, UK) and dry pump (GX100N, Edwards, Burgess Hill, UK) [10]. The cut-off probe (CP) and Langmuir probe (LP) were measured 200 mm from the center of the chamber and 20 mm from the wafer surface.…”

Correlation of SiO2 etch rate in CF4 plasma with electrical circuit parameter obtained from VI probe in inductively coupled plasma etcher

“…Moreover, there have also been studies about the correlation between plasma parameters and electrical parameters obtained by VI probe. Kim et al [10] analyzed the correlation between plasma parameters and the data obtained by VI probe in inductively coupled plasma reactor using N 2 gas. They observed that a plasma density and a plasma temperature were strongly correlated to the difference between a plasma potential and a floating potential.…”