Composition control of PZT thin films by varying technological parameters of RF magnetron sputter deposition

Designing Morphotropic Phase Composition in BiFeO3

“…One means to make transient observations of morphotropic phase space is by using temperature-dependent studies, which allow thermal expansion to drive phase composition transitions. , As-grown BFO films on LAO typically show a rich pattern of mixed phase nanodomains embedded in a matrix of a macroscopically tetragonal phase . These nanodomains are known to consist of stripes of highly distorted variants of T-like BFO (T tilt ) and S-BFO (S tilt ) that are energetically favorable to promote strain relaxation toward the significantly less distorted R-like BFO. , With increasing temperature, the nanodomains progressively disappear as the BFO film transitions to a single-domain T-like state …”

“…Schematic phase diagram based on the structural characterization of strain-doped BFO films. The inset shows the temperature-composition phase diagram of the classical morphotropic PbZr x Ti 1– x O 3 system for comparison …”

“…The lower in-plane strain of films on LSAT appears to shift the system to a state that is similar to the region near the triple point in the classical phase diagram that display direct transitions between R and T phases over a narrow composition range. 19 Density functional theory predictions on BFO have shown that R and T polymorphs are energetically degenerate under moderate compressive in-plane strain, thus the observations of direct R → T transitions are not so surprising. 22,27 In particular, the free energy landscape is extremely flat in an out-of-plane-only lattice expansion scenario, 28 which means that a direct transition is thermodynamically allowed.…”

Composition control of Zn1-xMgxO thin films grown using mist chemical vapor deposition

“…8) The stoichiometry of SrTiO 3 film can be formed by controlling the ablation laser beam or using binary-oxide targets in the PLD 9,10) and by adjusting the gas pressure in the RF-SPT. [11][12][13] On the other hand, in equilibrium reaction systems such as chemical vapor deposition (CVD), spray pyrolysis, aerosol-assisted chemical vapor deposition, and atomic layer deposition (ALD), it is important to control the chemical reactions in order to control the film growth rate and composition ratio. Normally, in an equilibrium reaction process, film composition control is rarely possible because different precursors are involved in the system and cause complex reactions and complex products.…”