2019
DOI: 10.1002/smll.201805042
|View full text |Cite
|
Sign up to set email alerts
|

Complementary Resistive Switching Using Metal–Ferroelectric–Metal Tunnel Junctions

Abstract: devices can be scaled down as required by the most aggressive scaling in electronic industry. This is an important advantage compared with electronic memory devices based on electric charge storage. [1][2][3] In fact, the resistive random access memory (RRAM) elements are intensively investigated on the path toward higher memory density and enhanced computing performance, as demanded by present and future information technologies. The socalled passive crossbar array of RS devices constitutes the backbone of RR… Show more

Help me understand this report

Search citation statements

Order By: Relevance

Paper Sections

Select...
4

Citation Types

0
9
1

Year Published

2019
2019
2021
2021

Publication Types

Select...
9

Relationship

2
7

Authors

Journals

citations
Cited by 15 publications
(10 citation statements)
references
References 57 publications
0
9
1
Order By: Relevance
“…Combining density functional theory calculations with non equilibrium Green's function formalism, we investigate the electron transport properties of SrRuO 3 /ZnO/BaTiO 3 /ZnO/SrRuO 3 and SrRuO 3 /ZnO/BaTiO 3 / SrRuO 3 with a giant TER effect of 581% and 112% respectively. Compared to the previous results, [27][28][29][30][31] the TER effect of 581% for the tunnel junction combined ZnO and (111) BaTiO 3 in this article is larger than the highest TER effect of 400% 31 for the previous BaTiO 3 -based tunnel junctions. The junctions combined ZnO and (111) BaTiO 3 may exhibit richer and more novel properties in the future.…”
Section: Introductioncontrasting
confidence: 86%
“…Combining density functional theory calculations with non equilibrium Green's function formalism, we investigate the electron transport properties of SrRuO 3 /ZnO/BaTiO 3 /ZnO/SrRuO 3 and SrRuO 3 /ZnO/BaTiO 3 / SrRuO 3 with a giant TER effect of 581% and 112% respectively. Compared to the previous results, [27][28][29][30][31] the TER effect of 581% for the tunnel junction combined ZnO and (111) BaTiO 3 in this article is larger than the highest TER effect of 400% 31 for the previous BaTiO 3 -based tunnel junctions. The junctions combined ZnO and (111) BaTiO 3 may exhibit richer and more novel properties in the future.…”
Section: Introductioncontrasting
confidence: 86%
“…This results in low tunneling current and high resistance values. Whereas high resistance is desirable for some applications, for instance, in ferroelectric complementary resistive switching devices, 49,50 a sizable current is required to achieve fast and reliable reading operation of memory devices, and a trade-off needs to be found. 3 Different strategies can be followed to reduce the device resistance: first is to use metals with a lower work function to reduce the tunneling barrier height (at the expense of usually higher reactivity of the metal); second is to stimulate Fowler− Nordheim tunneling (at the expense of requiring higher reading voltages); 51 and third is to reduce the barrier thickness.…”
Section: ■ Introductionmentioning
confidence: 99%
“…This results in low tunneling current and high resistance values. Whereas high resistance is desirable for some applications, for instance, in ferroelectric complementary resistive switching devices, , a sizable current is required to achieve fast and reliable reading operation of memory devices, and a trade-off needs to be found …”
Section: Introductionmentioning
confidence: 99%
“…4 By leveraging their conditional RS properties, logic operations can be executed in multiple device architectures, including one memristor−one resistor (1M1R), 5 one transistor−one RRAM (1T1R), 6 one selector−one RRAM (1S1R), 7 and complementary RS. 8 Based on these structures, noteworthy progress in this area has been achieved, including material implications, 16 logic operations, full adder, flip flop, and shifting register. 9−11 Among most of those strategies, additional selection devices seem to be a requisite for the realization of logical functions in memristor architecture.…”
Section: Introductionmentioning
confidence: 99%