Abstract:In this paper we will examine some of the fundamental imaging effects that must be considered with the intended implementation of Extreme Ultraviolet Lithography (EUVL). The paper will show how simulation can be used to examine issues such as image placement and the effect of mask dimension errors. We will show how the exact structure of an EUV mask need not be simulated, but the use of Fourier boundary conditions may be used as an accurate substitute, considerably speeding up computation time. Further, this t… Show more
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