2008
DOI: 10.1016/j.mejo.2008.01.056
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Comparison of ZnO thin films deposited by three different SILAR processes

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Cited by 25 publications
(11 citation statements)
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“…The entire structure repertoire has generated increased interest due to the rise of nanoscience and nanotechnology. By controlling the growth conditions, it is possible to generate specific diameters, lengths, structural defects, and alignments . Several growth techniques, such as combustion synthesis, chemical solution method, chemical vapor deposition, microemulsion route, vapor‐solid mechanism, sol–gel method, microwave‐assisted synthesis, and plasma‐molecular beam epitaxy, have been used to obtain ZnO.…”
Section: Introductionmentioning
confidence: 99%
“…The entire structure repertoire has generated increased interest due to the rise of nanoscience and nanotechnology. By controlling the growth conditions, it is possible to generate specific diameters, lengths, structural defects, and alignments . Several growth techniques, such as combustion synthesis, chemical solution method, chemical vapor deposition, microemulsion route, vapor‐solid mechanism, sol–gel method, microwave‐assisted synthesis, and plasma‐molecular beam epitaxy, have been used to obtain ZnO.…”
Section: Introductionmentioning
confidence: 99%
“…The other peaks with lower intensity are observed at 331, 380, and 576 cm −1 , respectively. The peak at 331 cm −1 is caused by the vibration mode due to the multiple‐phonon scattering processes, 16,17 and the peaks at 380 and 576 cm −1 correspond to the transverse optical phonon and longitudinal optical phonon (LO) of the A 1 mode, respectively, where the LO A 1 mode is caused by the defects of oxygen vacancies 18,19 . Compared with the sample in air atmosphere, the peak at 576 cm −1 shifts to a higher wavenumber by 2 cm −1 for the sample in nitrogen atmosphere and by 7 cm −1 in hydrogen atmosphere.…”
Section: Resultsmentioning
confidence: 97%
“…ZnO thin films have been prepared by various chemical and physical deposition techniques such as sputtering, pulsed laser ablation, successive ionic layer adsorption and reaction (SILAR) , Gao et al 2007, Jimenez-Gonzailez et al 1995, Kumar et al 2011, Lupan et al 2008, Shishiyanu et al 2005, Vargas-Hernandez et al 2008, sol-gel (Habibia and Sardashtia 2008, Jain et al 2007, Li et al 2005, chemical bath deposition (CBD) (Drici et al 2004, Miyazaki et al 2006, Yamada et al 2005, and chemical vapor deposition (CVD) (Sun et al 2008). Among them, the solution approached based on the chemical technique has attracted increasing attention in recent years owing to its relatively low temperature requirement, low cost, high reliability, and ability to deposit films over large areas.…”
Section: Introductionmentioning
confidence: 99%