Comparison of photosensitivity in germanium doped silica fibers using 244 nm and 266 nm continuous-wave lasers

Jensen, Jørgen Birger; Varming, Poul; Liu, B.; Gries, Wolfgang

doi:10.1109/ofc.2001.928542

Cited by 2 publications

(1 citation statement)

References 6 publications

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“…7) In fact, the increase would appear to be the result of a complex interaction of the two. When Ge-doped glass is irradiated with low-fluence UV light, Δn reaches an order of 10 -4 , 8,9) and with high-fluence UV light, an order of 10 -3 , saturating at 1 ~ 2 × 10 -3 , [10][11][12] and enhancements achieved through hydrogen loading only contribute to the reaching of a saturated Δn of 3.4 × 10 -3 . 13) With respect to Δn achieved with focused infrared ultrashort pulse laser irradiation, a previous report attributes a 2 × 10 -2 level densification of silica glass that is unrelated to any effect on Ge ions.…”

Section: Discussionmentioning

confidence: 99%

Increasing the Refractive Index of a Germanosilicate Planar Waveguide by Irradiation with an Infrared Ultrashort Pulse Laser.

Kouta¹,

Urino²,

Hanada³

et al. 2002

The Review of Laser Engineering

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Reported here is the use of the focused beam of an infrared ultrashort pulse laser (150 femtoseconds pulse width, 200 kHz repetition rate, 800 nm wavelength, and 100 μm/s scanning speed) to increase the refractive index of a germanium-doped silica-glass planar waveguide. The increase obtained, Δn, itself increases in proportion to increases in the laser intensity of the surface irradiation, and it saturates to 1.6 ~ 1.8 × 10 -3 at 2.2 TW/cm 2 , without producing any increase in insertion loss and birefringence. Further, no decay in the refractive index change is observed after annealing at 200 ˚C for 10 hours. Results show that ultrashort pulse lasers are more suitable than UV lasers as light sources for highly stable adjustment of the optical lengths of waveguide devices.

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Section: Discussionmentioning

confidence: 99%

Increasing the Refractive Index of a Germanosilicate Planar Waveguide by Irradiation with an Infrared Ultrashort Pulse Laser.

Kouta¹,

Urino²,

Hanada³

et al. 2002

The Review of Laser Engineering

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show abstract

Implementación de Sistema Óptico para Grabado de Redes de Bragg en Fibra Óptica

2011

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ResumenEn este trabajo se presenta la implementación de un sistema óptico para el grabado de redes de Bragg en fibra óptica, empleando la técnica de la máscara de fase. El método consiste en irradiar una fibra fotosensible con un patrón de intensidades adecuado de luz UV que genera una modulación espacial del índice de refracción del núcleo de la fibra y forma la red de Bragg. Como fuente de iluminación se utiliza un láser pulsado de Nd-YAG cuadruplicado en frecuencia, con emisión en 266 nm. Se describe el sistema desarrollado, se analizan los resultados y se mencionan aplicaciones desarrolladas con las redes fabricadas. Palabras clave: fibra óptica, redes de Bragg en fibra, máscara de fase, láser de Nd-YAG AbstractThis work presents the implementation of an optical system for fiber Bragg grating writing by using the phase mask technique. The method consists of radiating a photosensitive optical fiber with a suitable intensity pattern of UV light that generates a spatial modulation of the fiber core refraction index and creates the Bragg grating. As light source a beam of an Nd-YAG pulsed laser, of quadrupled frequency, and 266 nm emission, was used. The proposed system is described, the results are analyzed, and applications developed with fiber Bragg grating are mentioned.

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Comparison of photosensitivity in germanium doped silica fibers using 244 nm and 266 nm continuous-wave lasers

Cited by 2 publications

References 6 publications

Increasing the Refractive Index of a Germanosilicate Planar Waveguide by Irradiation with an Infrared Ultrashort Pulse Laser.

Increasing the Refractive Index of a Germanosilicate Planar Waveguide by Irradiation with an Infrared Ultrashort Pulse Laser.

Implementación de Sistema Óptico para Grabado de Redes de Bragg en Fibra Óptica

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