Comparison of On-Wafer Calibrations

Williams, Dylan F.; Marks, Roger B.; Davidson, Andrew

doi:10.1109/arftg.1991.324040

Cited by 190 publications

(73 citation statements)

References 8 publications

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“…Fig. 6 shows a comparison of calibration coefficients for the four sets of measurements following the technique presented in [35]. This technique evaluates the worst-case deviations of the measured S-parameters for an examined calibration with respect to a benchmark calibration.…”

Section: Results and Analysismentioning

confidence: 99%

Robust Microwave Characterization of Inkjet-Printed Coplanar Waveguides on Flexible Substrates

Sahu

Aaen

Lewandowski

et al. 2017

IEEE Trans. Instrum. Meas.

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Abstract-In this paper, we propose a robust microwave characterization of inkjet printed components on flexible substrates, which aim at measuring the material properties of silver nanoparticle inks and the supporting dielectric spacer employed during measurements. Starting with propagation constant extracted from multiline thru-reflect-line calibration with coplanar waveguide (CPW) standards and then proceeding with finite element modeling of CPWs, the proposed technique can dynamically produce an interpolated search space by automatic driving of simulation tools. In the final stage, the algorithm utilizes a least-square optimization routine to minimize the deviation between model and measurements. Our technique significantly reduces the computing resources and is able to extract the material parameters using even a nominal ink profile. Characteristic impedances for CPWs are extracted using series resistor measurements from 10 MHz to 20 GHz. It is also shown that the proposed characterization methodology is able to detect any changes in material properties induced by changes in fabrication parameters such as sintering temperature. Ink conductivities of approximately 2.973 × 10 0.201 × 10 7 S/m respectively. We verified our technique by measuring the material parameters with conventional approach.

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Section: Results and Analysismentioning

confidence: 99%

Robust Microwave Characterization of Inkjet-Printed Coplanar Waveguides on Flexible Substrates

Sahu

Aaen

Lewandowski

et al. 2017

IEEE Trans. Instrum. Meas.

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“…They also show a close match with the impedances from MTRL calibrations, which proves the validity of the proposed LRRM in terms of shunt load characterization. The LRM, LRMM, and LRRM calibrations are compared with on-wafer MTRL calibrations using the calibration comparison technique [28]. Calibration comparison is a known method for comparing two calibrations.…”

Section: Measurementsmentioning

confidence: 99%

“…As a conclusion, LRM, LRMM, and LRRM all show good accuracies up to 110 GHz. The LRM, LRMM, and LRRM calibrations are compared with on-wafer MTRL calibrations using the calibration comparison technique [28]. Calibration comparison is a known method for comparing two calibrations.…”

Section: Measurementsmentioning

confidence: 99%

A Unified Approach for Reformulations of LRM/LRMM/LRRM Calibration Algorithms Based on the T-Matrix Representation

Zhao

Liu²,

Wang

et al. 2017

Applied Sciences

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This paper investigates a unified theory to derive vector network analyzer calibration algorithms based on the T-matrix representation, by which means the line-reflect-match (LRM), line-reflect-match-match (LRMM), and the line-reflect-reflect-match (LRRM) calibrations are formulated. The proposed calibration theory is more general than other versions of LRM, LRMM, and LRRM in that an arbitrary known two-port device can be used as the line standard L, rather than a perfect thru or transmission line. Experimental verifications of the proposed theory using on-wafer calibrations from 0.5 GHz to 110 GHz are given.

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“…We used the calibration comparison method of [13] to investigate the impact of the displaced line on calibration accuracy. The calibration comparison method determines a bound on the worst-case differences of the scattering parameters of two passive devices measured by the two calibrations.…”

Section: A Imperfect Line Standardmentioning

confidence: 99%

Rectangular-waveguide vector-network-analyzer calibrations with imperfect test ports

Williams

2010

2010 76th ARFTG Microwave Measurement Conference

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Abstract-We present a strategy for correcting for imperfect interfaces between the test ports of a vector network analyzer, the calibration standards and the devices under test. This corrects for the inconsistencies in calibrations introduced by use of flush thrus and flat shorts as calibration standards. The approach is based on equivalent standard definitions that are easy to implement in conventional network analyzers. We present analytic formulas for these definitions and demonstrate them in WR-90 rectangular waveguide.Index Terms-Calibration, submillimeter wave, vector network analyzer.

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Comparison of On-Wafer Calibrations

Cited by 190 publications

References 8 publications

Robust Microwave Characterization of Inkjet-Printed Coplanar Waveguides on Flexible Substrates

Robust Microwave Characterization of Inkjet-Printed Coplanar Waveguides on Flexible Substrates

A Unified Approach for Reformulations of LRM/LRMM/LRRM Calibration Algorithms Based on the T-Matrix Representation

Rectangular-waveguide vector-network-analyzer calibrations with imperfect test ports

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