2020
DOI: 10.1039/d0ra08776a
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Comparison of NiOxthin film deposited by spin-coating or thermal evaporation for application as a hole transport layer of perovskite solar cells

Abstract: We compared nickel oxide (NiOx) deposited by thermal evaporation and that deposited by the spin-coating process, for use in the hole transport layers of inverted planar perovskite solar cells (PSCs).

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Cited by 36 publications
(21 citation statements)
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“…When the perovskite precursor was dropped on the NiO x /SAM HTL, the contact angle significantly decreased to 11.1°, since the rough morphology and exposed NiOOH on the spin-coated NiO x film surface can provide sufficient wettability for the perovskite precursor. 54 The larger grain growth resistance on the hydrophilic NiO x HTL leads to a smaller average grain size of 178 nm (Fig. S5†) than the that on the bare IWO substrate (Fig.…”
Section: Resultsmentioning
confidence: 99%
“…When the perovskite precursor was dropped on the NiO x /SAM HTL, the contact angle significantly decreased to 11.1°, since the rough morphology and exposed NiOOH on the spin-coated NiO x film surface can provide sufficient wettability for the perovskite precursor. 54 The larger grain growth resistance on the hydrophilic NiO x HTL leads to a smaller average grain size of 178 nm (Fig. S5†) than the that on the bare IWO substrate (Fig.…”
Section: Resultsmentioning
confidence: 99%
“…It is known that in its stoichiometric form, NiO is an insulator. NiO material, obtained by different methods, is a metal-deficient p-type semiconductor; therefore, Ni vacancies are present at the cation lattice site [ 9 ]. Due to Ni vacancies, some Ni 2+ ions must be converted to Ni 3+ ions in order to maintain the electrical neutrality in the structure [ 9 ].…”
Section: Resultsmentioning
confidence: 99%
“…NiO material, obtained by different methods, is a metal-deficient p-type semiconductor; therefore, Ni vacancies are present at the cation lattice site [ 9 ]. Due to Ni vacancies, some Ni 2+ ions must be converted to Ni 3+ ions in order to maintain the electrical neutrality in the structure [ 9 ]. The Ni 2+ deficiency, Ni 3+ presence, and oxygen-rich nature directly contribute to the p-type conductivity of the NiO x film [ 53 ].…”
Section: Resultsmentioning
confidence: 99%
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“…An AgNWs film with an irregularly connected network has been applied in flexible electronics and wearable devices due to its high conductivity, low sheet resistance, good flexibility and simple solution-based coating process [44][45][46]. It is possible to produce a cost-effective AgNWs FTCE because it can be printed by spin coating [47,48], bar coating [49], slot die coating [7,50], brush painting [51], and spray coating [52] at room temperature. However, a reduction in the AgNW concentration in ink for the purpose of confirming high transmittance resulted in a reduction in the inter-link connectivity of the AgNWs and increased the sheet resistance.…”
Section: Introductionmentioning
confidence: 99%