2006
DOI: 10.1063/1.2174121
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Comparison of nanostructure characteristics of ZnO grown on GaN and sapphire

Abstract: The immature developments of p-type ZnO and ZnO-related ternary or quaternary compound and the small lattice mismatch between ZnO and GaN stimulate interest in the hybrid growth of ZnO and GaN. In this research, we compared the nanostructures and optical properties of two ZnO thin-film samples grown under the same conditions but on different underlying materials ͑sapphire and GaN͒. With the high growth temperature of 450 °C, both samples show domain structures. However, in contrast to the sample of ZnO on sapp… Show more

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Cited by 17 publications
(7 citation statements)
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“…As such, fabricated films have high dislocation densities . For high efficiency optical and electronic devices, a key requirement common to both ZnO and GaN is to grow epitaxial layers with low defect density, which depends strongly on the choice of substrates as well as on the crystal quality of intermediate or buffer layers. Several approaches aimed at reducing the dislocation density in GaN layers have been successfully applied. The representative methods are epitaxial lateral overgrowth (ELO) and pendeoepitaxy (PE), which result in low defect density in selected areas. However, these techniques are not effective for ZnO films, and the systematic studies on the development of novel methods are lacking.…”
Section: Introductionmentioning
confidence: 99%
“…As such, fabricated films have high dislocation densities . For high efficiency optical and electronic devices, a key requirement common to both ZnO and GaN is to grow epitaxial layers with low defect density, which depends strongly on the choice of substrates as well as on the crystal quality of intermediate or buffer layers. Several approaches aimed at reducing the dislocation density in GaN layers have been successfully applied. The representative methods are epitaxial lateral overgrowth (ELO) and pendeoepitaxy (PE), which result in low defect density in selected areas. However, these techniques are not effective for ZnO films, and the systematic studies on the development of novel methods are lacking.…”
Section: Introductionmentioning
confidence: 99%
“…The c-ZnO thin film exhibits the sixfold symmetry. In details, the epitaxy relationship is described by ZnO [11][12][13][14][15][16][17][18][19][20]//STO [1][2][3][4][5][6][7][8][9][10] and ZnO [11][12][13][14][15][16][17][18][19][20]//STO [2-1-1]. The lattice mismatch between ZnO and STO in this epitaxy mode is only *1.9 %, much smaller than that between c-ZnO and sapphire, and the lattice match geometry is schematically shown in Fig.…”
mentioning
confidence: 99%
“…However, defects are easily generated in epitaxial ZnO films on the sapphire due to the large lattice mismatch of 18 % [14], including misfit dislocations [15,16] and twin domains [14,17,18]. On the other hand, increasing attentions are paid to obtain in-plane polar epitaxial ZnO films, such as (10-10)-oriented (m-plane) and (11)(12)(13)(14)(15)(16)(17)(18)(19)(20)-oriented (a-plane) ones [19]. It is known that ZnO has its intrinsic electrical polarity along the c-axis in the wurtzite structure, and thus, the c-ZnO thin films inevitably suffer the quantum-confined Stark effect (QCSE), which reduces the exciton binding energy and limits the optical performance.…”
mentioning
confidence: 99%
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