2009
DOI: 10.1021/cg900907d
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ZnO Wurtzite Single Crystals Prepared by Nanorod-Assisted Epitaxial Lateral Overgrowth

Abstract: We have developed a novel method to grow thick single crystalline ZnO films for the use of supporting layers by employing nanorod-assisted epitaxial lateral overgrowth (NRELO). The NRELO ZnO films were epitaxially grown on vertically arrayed nanorods at reduced temperatures by metalorganic chemical vapor deposition. The resultant films had epitaxial structures similar to the conventional ZnO films on sapphire and relatively low dislocation density. During the growth evolution of the NRELO films, the dominant s… Show more

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Cited by 12 publications
(4 citation statements)
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“…At the very beginning, hexagonal cross‐section ZnO nanowires are grown vertically on the sapphire substrate. With the increase of the growth time, the length and density of the ZnO nanowires increase, leading to a film‐like ZnO formed on top of the vertically aligned nanowires 21. The transformation from 1D nanowires to a 2D film is similar to the characteristic of epitaxial lateral overgrowth, which has been found for material growth of GaN and ZnO 22, 23.…”
mentioning
confidence: 62%
“…At the very beginning, hexagonal cross‐section ZnO nanowires are grown vertically on the sapphire substrate. With the increase of the growth time, the length and density of the ZnO nanowires increase, leading to a film‐like ZnO formed on top of the vertically aligned nanowires 21. The transformation from 1D nanowires to a 2D film is similar to the characteristic of epitaxial lateral overgrowth, which has been found for material growth of GaN and ZnO 22, 23.…”
mentioning
confidence: 62%
“…Several synthetic routes are known for ZnO powder such as sol-gel method [3,4], pyrolysis of chelate complexes [5], spray pyrolysis [6], and thermal decomposition of precursors [7]. Organometallic precursors such as diethyl zinc [8][9][10], dicyclohexyl zinc [11], and dimethylzinc [12] were also used as precursors for nano-sized ZnO. The dialkylzinc precursors are pyrophoric and hence extra precautions need to be taken in handling these precursors.…”
Section: Introductionmentioning
confidence: 99%
“…On the other hand, this kind of internal stress relaxation not only enhanced dielectric property but also induced the grain size growth. 22 bimetallic inserting layer. The grains size in fraction of pure ZnO thin film with 150 nm thick ranged from 22 to 43 nm, with an average size of 32.5 ± 10.5 nm as shown in the Fig.…”
Section: Resultsmentioning
confidence: 99%