Present work reports the growth of BFO/WO 3 bilayer thin film structures over Silicon, corning and ITO coated glass substrates. BFO layer in BFO/WO 3 bilayer structure was deposited using Pulsed Laser deposition (PLD) technique at optimized laser energy (200 mJ) while WO 3 nanostructured layer was deposited using rf-magnetron sputtering technique at varying glancing angle from 65 to 80 . For the realization of MBM (metal-bilayer-metal) device, top Gold (Au) electrodes have been deposited using thermal evaporation technique. The BFO/WO 3 bilayer structure fabricated at 70 glancing angle exhibited the saturation (P s ) and remnant (P r ) polarization as 45.45 μC/cm 2 and 21.52 μC/cm 2 respectively, which are appreciably higher than the earlier reports for pure BFO thin films. Enhanced energy storage characteristics were obtained in Au/BFO/WO 3 /ITO structure fabricated at 70 glancing angle with chargedischarge efficiency (63%) and enlarged recoverable energy density (467 mJ/cm 3 ). Achieved results indicate the utilization of fabricated Au/BFO/ WO 3 /ITO structures towards high energy storage applications.