2011
DOI: 10.1016/j.mseb.2011.02.028
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Comparison of Fe and Si doping of GaN: An EXAFS and Raman study

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Cited by 12 publications
(12 citation statements)
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“…14,17 At particular, it is expected to be considerable at high dopant concentrations. However, their A 1 (LO) peaks move towards the higher energy side as the Si doping concentration increases.…”
Section: Resultsmentioning
confidence: 99%
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“…14,17 At particular, it is expected to be considerable at high dopant concentrations. However, their A 1 (LO) peaks move towards the higher energy side as the Si doping concentration increases.…”
Section: Resultsmentioning
confidence: 99%
“…It should be noted that the incorporation of foreign atoms into GaN can introduce a hydrostatic strain. 14,17 At particular, it is expected to be considerable at high dopant concentrations. In the Si-doped GaN epilayers studied in the present work, no observable shi is observed for the E high 2 mode, suggesting that the residual strain shows no observable change with increasing the Si doping concentration at least in the interested range, i.e., <9 Â 10 17 cm À3 .…”
Section: Resultsmentioning
confidence: 99%
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“…These low values indicate that all the silicon atoms are activated and the carrier concentration determined represents the dopant concentration [250].…”
Section: Characterization Of Gan/aln On Si (111)mentioning
confidence: 99%