“…It should be noted that the incorporation of foreign atoms into GaN can introduce a hydrostatic strain. 14,17 At particular, it is expected to be considerable at high dopant concentrations. In the Si-doped GaN epilayers studied in the present work, no observable shi is observed for the E high 2 mode, suggesting that the residual strain shows no observable change with increasing the Si doping concentration at least in the interested range, i.e., <9 Â 10 17 cm À3 .…”