Comparative study of textured and epitaxial ZnO films

Characterization of ZnO thin films deposited on diamond-like carbon coated onto Si and SiO2/Si substrate

“…ZnO has been considered to be a very promising film for fabricating small-size highfrequency SAW devices. ZnO films with single crystal quality have also been reported to provide very high piezoelectric coupling coefficients [3]. Selection of substrate materials on which ZnO film is grown is very important for achieving a high-quality ZnO film since the difference in lattice parameters and crystalline structures between ZnO and substrate materials may significantly affect the growth behavior of ZnO film [4].…”

Atmospheric pressure MOCVD growth of high-quality ZnO films on GaN/Al2O3 templates

“…Many growth techniques for single-crystalline ZnO films have been studied, such as molecular beam epitaxy [3], metalorganic chemical vapor deposition (MOCVD) [4], RF magnetron sputtering [5], and pulsed laser deposition [6]. Among these techniques, MOCVD has many advantages for bulk production and has been proven to be suitable for growth of many electronic and optoelectronic materials.…”

Structural and optical properties of electrodeposited ZnO thin films on conductive RuO2 oxides

“…The use of ultra-thin ZnO buffer for the growth of electrodeposited ZnO thin films on the RuO 2 /SiO 2 /Si substrates helps to reduce possible defects which might be easily generated when the rod-like ZnO thin films were formed without a ZnO buffer layer on the RuO 2 /SiO 2 /Si substrates. The optical properties of the ZnO thin films have been investigated with different degrees of crystal quality [33]. The enhancement of UV emission of ZnO thin films with a thin homointerlayer has been demonstrated in sputtering deposited ZnO thin films on SrTiO 3 substrates and pulsed laser deposited ZnO thin films on sapphire substrates [2,34].…”