1998
DOI: 10.1016/s0040-6090(97)00349-0
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Comparative study of surface roughness measured on polysilicon using spectroscopic ellipsometry and atomic force microscopy

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Cited by 91 publications
(48 citation statements)
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“…The Ellipsometry study showed that the polySi layer roughness has undergone a growth under the effect of the phosphorus thermal diffusion. It increases from 22.2 Å to a value between 23 and 58 Å, depending on the doping level, which agrees with SEM/AFM characterizations and what has been published elsewhere [3,4], in case of the temperature deposition of 625°C.…”
Section: Extended Abstractsupporting
confidence: 92%
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“…The Ellipsometry study showed that the polySi layer roughness has undergone a growth under the effect of the phosphorus thermal diffusion. It increases from 22.2 Å to a value between 23 and 58 Å, depending on the doping level, which agrees with SEM/AFM characterizations and what has been published elsewhere [3,4], in case of the temperature deposition of 625°C.…”
Section: Extended Abstractsupporting
confidence: 92%
“…The Ellipsometry study showed that the polySi layer roughness has undergone a growth under the effect of the phosphorus thermal diffusion. It increases from 22.2 Å to a value between 23 and 58 Å, depending on the doping level, which agrees with SEM/AFM characterizations and what has been published elsewhere [3,4], in case of the temperature deposition of 625°C.Secondly, one noticed that ellipsometric angles curves were regularly shifted towards low wavelengths when the electrical conductivity increases and the wavelengths gap between the extrema angles, for the same curve, was monotonically decreasing in the same situation. Besides, Psi angle maxima and minima were growing till the doping level reaches a limit (when approaching the phosphorus solubility limit), then started to diminish.…”
supporting
confidence: 92%
“…Fang et al 28 studied the relationship between the AFM roughness and the ellipsometric parameters for a chemically treated rough Si surface and showed that AFM roughness without the roughness spectral density information does not determine the ellipsometry parameters unambiguously. However, to our knowledge, all papers published to date deal with either soft organic films 3,20,27,29 or solid semiconductor/dielectric surfaces, 28,30,31 but not both together.…”
Section: Introductionmentioning
confidence: 99%
“…[25]). The surface nanoroughness is also considered as a homogeneous layer [9], the thickness of which correlates with the root mean square roughness [22]. There are more sophisticated theories to analyze the surface roughness from the polarized optical response [14], but the robustness of the above effective medium approach makes it a popular, most widely used method.…”
Section: Measurable Nanocrystal Propertiesmentioning
confidence: 99%
“…Note however, that the accurate, validated determination of the root mean square roughness is a problem even by scanning probe methods, because the obtained numerical value may strongly depend on the measurement configuration (e.g. the window size or the quality of the tip, [22]). In Fig.…”
Section: Measurable Nanocrystal Propertiesmentioning
confidence: 99%