2016
DOI: 10.1088/1742-6596/700/1/012039
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Comparative study of RF reactive magnetron sputtering and sol-gel deposition of UV induced superhydrophilic TiOx thin films

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Cited by 4 publications
(3 citation statements)
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“…As also reported for other photoactive, low-dimensional metal oxide nanomaterials, the superhydrophobic character of the surfaces can be recovered by heating, dark storage during a few weeks, or in a low vacuum overnight. [33][34][35][36][37] These results open the path for the use of the TiO 2 nanomembranes as photonic microfluidic valves for the selection of liquids under light activation and as self-cleaning membranes or sensors, which can be further used for photocatalytic removal of water pollutants. [38] 2.5.…”
Section: Photoactivation Of 3d Nanomembranes For a Selective Control Wettingmentioning
confidence: 91%
“…As also reported for other photoactive, low-dimensional metal oxide nanomaterials, the superhydrophobic character of the surfaces can be recovered by heating, dark storage during a few weeks, or in a low vacuum overnight. [33][34][35][36][37] These results open the path for the use of the TiO 2 nanomembranes as photonic microfluidic valves for the selection of liquids under light activation and as self-cleaning membranes or sensors, which can be further used for photocatalytic removal of water pollutants. [38] 2.5.…”
Section: Photoactivation Of 3d Nanomembranes For a Selective Control Wettingmentioning
confidence: 91%
“…are simple and economic for the deposition of high-surface-area porous TiO 2 films, but they suffer from mechanical instabilities and residual impurities, low crystallinity, and poorer wetting properties, unless the films are post annealed at high temperature [ 6 , 7 ]. RF/DC magnetron sputtering is a versatile vapor deposition method exhibiting remarkable results in the low-temperature deposition of crystalline thin films and is also suitable for large-area depositions [ 8 , 9 , 10 , 11 ]. In the absence of substrate heating, a crystalline structure is obtained due to the electron and ion bombardment during deposition, which provides a sufficient amount of energy for crystallization but does not severely raise the temperature of the bulk substrate.…”
Section: Introductionmentioning
confidence: 99%
“…In the absence of substrate heating, a crystalline structure is obtained due to the electron and ion bombardment during deposition, which provides a sufficient amount of energy for crystallization but does not severely raise the temperature of the bulk substrate. Both rutile and anatase TiO 2 thin films have been deposited on unheated substrates by tuning different magnetron sputtering process parameters [ 8 , 9 , 10 , 11 ]. Room-temperature deposition of the anatase phase has been accomplished at elevated total and/or oxygen partial pressure [ 10 , 12 , 13 , 14 , 15 ], at larger target-to-substrate distances [ 11 ], or on a crystalline substrate [ 16 ].…”
Section: Introductionmentioning
confidence: 99%