Comparative study of applied potential differences in electrodeposition for fabricating metallic-oxide films

Abstract

In this paper, we have reported a comparative deposition mechanism based on Electrodeposition method for a numbers of applied potential differences (PD) between the electrodes ranging from 0.62Vdc to 0.82Vdc. Keeping same concentration of zinc nitrate electrolyte as well as maintaining a constant distance between electrodes we conduct a computerized Electrodeposition. Current versus voltage (I-V), voltage versus time (V-T) and current versus time (I-T) characteristics obtained from computerized Electrodeposition method have been analyzed to figure out deposition rate, movement of ions as well as formation mechanism of metallic oxide films (ZnO) on FTO substrate. Optical analysis i.e. transmittance measurement ofZnO film has been done by "HALO SB 10 (UV VIS single beam spectrophotometer)" utilizing a range of light that stands from 320nm to 760nm as wave length. Presence of ZnO as films on FTO has been confirmed as band gap energy calculated from transmittance measurement for both direct and indirect reveals 3.17eV and 3.10eV respectively. Finally we have optimized a potential among those (0.62V to 0.82V), based on their comparative performance of depositing films.