2019
DOI: 10.1134/s1063782619030187
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Comparative Studies of AlGaAs/InGaAs Enhancement/Depletion-Mode High Electron Mobility Transistors with Virtual Channel Layers by Hybrid Gate Recesses Approaches

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Cited by 2 publications
(3 citation statements)
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“…The integrated structure of AlGaAs/InGaAs PHEMTs was the same as the devices studied in Ref. 13. First, a mesa structure provided the required isolation to distinguish the D-mode and E-mode devices with the solution of H 3 PO 4 : H 2 O 2 : H 2 O = 1: 1: 20.…”
Section: Dcfl Inverter Structure and Fabricationmentioning
confidence: 99%
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“…The integrated structure of AlGaAs/InGaAs PHEMTs was the same as the devices studied in Ref. 13. First, a mesa structure provided the required isolation to distinguish the D-mode and E-mode devices with the solution of H 3 PO 4 : H 2 O 2 : H 2 O = 1: 1: 20.…”
Section: Dcfl Inverter Structure and Fabricationmentioning
confidence: 99%
“…[10][11][12] Recently, we have demonstrated the improved gate characteristics of the AlGaAs/InGaAs E-mode pseudomorphic HEMTs (PHEMTs) by way of hybrid gate recesses to remove the n-AlAs/i-GaAs/n-AlGaAs virtual channel layers upon 2DEG channels. 13 As compared to the D-mode device, the gate reverse currents are effectively reduced for the E-mode devices with additional gate recess time to remove part of the virtual channel layers. Furthermore, the hybrid gate recesses also enable the gate turn-on voltages to increase.…”
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confidence: 99%
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