Comparative investigation of TiAlC(N), TiCrAlC(N), and CrAlC(N) coatings deposited by sputtering of МАХ-phase Ti2−Cr AlC targets

Shtansky, Dmitry V.; Kiryukhantsev-Korneev, Ph. V.; Sheveyko, A.N.; Mavrin, B. N.; Rojas, T.C.; Fernández, A.; Левашов, Е. А.

doi:10.1016/j.surfcoat.2009.05.036

Cited by 80 publications

(61 citation statements)

References 52 publications

(63 reference statements)

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“…Very recently, Shtansky et al [244] claimed to have synthesized Cr 2 AlC by magnetron sputtering at 300 °C; this was based on an ambiguous electron-diffraction pattern which was directly contradicted by XRD. Some other groups have presented similar unsupported claims at conferences.…”

Section: Temperature Ranges For Max-phase Synthesismentioning

confidence: 99%

The M+1AX phases: Materials science and thin-film processing

et al. 2010

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This article is a critical review of the M n+1 AX n phases ("MAX phases", where n =1, 2, or 3) from a materials science perspective. MAX phases are a class of hexagonal-structure ternary carbides and nitrides ("X") of a transition metal ("M") and an A-group element. The most well known are Ti 2 AlC, Ti 3 SiC 2 , and Ti 4 AlN 3 . There are ~60 MAX phases with at least 9 discovered in the last five years alone. What makes the MAX phases fascinating and potentially useful is their remarkable combination of chemical, physical, electrical, and mechanical properties, which in many ways combine the characteristics of metals and ceramics. For example, MAX phases are typically resistant to oxidation and corrosion, elastically stiff, but at the same time they exhibit high thermal and electrical conductivities and are machinable. These properties stem from an inherently nanolaminated crystal structure, with M n+1 X n slabs intercalated with pure A-element layers. The research on MAX phases has been accelerated by the introduction of thin-film processing methods.Magnetron sputtering and arc deposition have been employed to synthesize single-crystal material by epitaxial growth, which enables studies of fundamental materials properties. However, the surface-initiated decomposition of M n+1 AX n thin films into MX compounds at temperatures of 1000-1100 °C is much lower than the decomposition temperatures typically reported for the corresponding bulk material. We also review the prospects for low-temperature synthesis, which is essential for deposition of MAX phases onto technologically important substrates. While deposition of MAX phases from the archetypical Ti-Si-C and Ti-Al-N systems typically require synthesis temperatures of ~800 °C, recent results have demonstrated that V 2 GeC and Cr 2 AlC can be deposited at ~450 °C. Also, thermal spray of Ti 2 AlC powder has been used to produce thick coatings. We further treat progress in the use of first-principles calculations for predicting hypothetical MAX phases and their properties. Together with advances in processing and materials 3 analysis, this progress has led to recent discoveries of numerous new MAX phases such as Ti 4 SiC 3 , Ta 4 AlC 3 , and Ti 3 SnC 2 . Finally, important future research directions are discussed. These include charting the unknown regions in phase diagrams to discover new equilibrium and metastable phases, as well as research challenges in understanding their physical properties, such as the effects of anisotropy, impurities, and vacancies on the electrical properties, and unexplored properties such as superconductivity, magnetism, and optics. 4

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Section: Temperature Ranges For Max-phase Synthesismentioning

confidence: 99%

The M+1AX phases: Materials science and thin-film processing

et al. 2010

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“…Thin films of Cr 2 AlC composition have reportedly been synthesized using magnetron sputtering techniques from elemental targets [6,7] and from compound targets [8,9]. In particular, using DC magnetron sputtering from a compound target, Walter et al [8] have reported formation of single-phase Cr 2 AlC thin films on stainless steel substrates heated at temperatures around 650 ℃.…”

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confidence: 99%

Incipient low-temperature formation of MAX phase in Cr–Al–C films

Crisan

2018

J Adv Ceram

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Ceramic-metallic MAX phase of chromium aluminium carbide ternary compounds was successfully obtained through deposition by DC sputtering onto Si substrates. A study of the influence of substrate temperature and in-air post-annealing on the film crystallinity and oxidation was undertaken. Scanning electron microscopy (SEM), wavelength-dispersive X-ray analysis (WDSX), and X-ray diffraction (XRD) were used for film characterization. It is shown that, at substrate temperature of about 450 ℃, as-deposited films are amorphous with small nanocrystals. Subsequent annealing in air at 700 ℃ leads to film crystallization and partial oxidation. WDSX spectroscopy shows that the films oxidise to a depth of around 120 nm, or 5% of total film thickness which amounts at around 2.68 µm. As a novelty, this demonstrates the possibility of in-air crystallization of Cr 2 AlC films without significant oxidation. Materials Analysis Using Diffraction (MAUD) software package for a full-profile analysis of the XRD patterns (Rietveld-type) was used to determine that, as a result of annealing, the average crystallite size changes from 7 to 34 nm, while microstrain decreases from 0.79% to 0.24%. A slight tendency of preferential growth along the (10 10) direction has been observed. Such texturing of the microstructure has the potential of inducing beneficial anisotropic fracture behaviour in the coatings, potentially interesting for several industrial applications in load-bearing devices.

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“…Hardness vs. annealing temperature Fig. 1 shows the hardness dependence on temperature for the TiAlSiCN coating and reference TiAlN [7], TiAlSiN [8] and TiAlCN [9] coatings in the temperature range 25-1600°C. A pronounced peak hardness of 49 GPa was previously reported after heat treatment of the TiAlSiCN coating at 1000°C [5].…”

Section: Resultsmentioning

confidence: 99%