2019
DOI: 10.1021/acs.jpca.8b12294
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Combined Spatially Resolved Optical Emission Imaging and Modeling Studies of Microwave-Activated H2/Ar and H2/Kr Plasmas Operating at Powers and Pressures Relevant for Diamond Chemical Vapor Deposition

Abstract: Microwave (MW) activated H2/Ar (and H2/Kr) plasmas operating under powers and pressures relevant to diamond chemical vapor deposition have been investigated experimentally and by 2-D modeling. The experiments return spatially and wavelength resolved optical emission spectra of electronically excited H2 molecules and H and Ar(/Kr) atoms for a range of H2/noble gas mixing ratios. The self-consistent 2-D(r, z) modeling of different H2/Ar gas mixtures includes calculations of the MW electromagnetic fields, the pla… Show more

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Cited by 11 publications
(31 citation statements)
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“…Tendencies towards {CN}max saturation are observed, however, in the limits of high N2 additions (X0(N2) >> X0(CH4), reflecting a shortage of carbon species, rows 4 and 5) but not at high CH4 additions (X0(CH4) >> X0(N2), rows 6, 7 and 9 in Table 3 and Figure S2). The rates of the critical reactions (38) and (−38) are highly equilibrated (Table 2) and the calculated pressure dependence {CN}max ≈ 6.5×10 11 [21]). A similar analyses of the current model outputs return the following P-dependence {CN}max ~ 6.5×10 11 ×(P/1500) 1.85 (with the input power P in W), cf.…”
Section: Relation [Cn] ~ [Hcn]×([h]/[h2]) ~ X0(n2)×([h]/[h2]mentioning
confidence: 93%
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“…Tendencies towards {CN}max saturation are observed, however, in the limits of high N2 additions (X0(N2) >> X0(CH4), reflecting a shortage of carbon species, rows 4 and 5) but not at high CH4 additions (X0(CH4) >> X0(N2), rows 6, 7 and 9 in Table 3 and Figure S2). The rates of the critical reactions (38) and (−38) are highly equilibrated (Table 2) and the calculated pressure dependence {CN}max ≈ 6.5×10 11 [21]). A similar analyses of the current model outputs return the following P-dependence {CN}max ~ 6.5×10 11 ×(P/1500) 1.85 (with the input power P in W), cf.…”
Section: Relation [Cn] ~ [Hcn]×([h]/[h2]) ~ X0(n2)×([h]/[h2]mentioning
confidence: 93%
“…By way of illustration, the calculated total numbers of ions are 2.06×10 13 and 1.73×10 13 for the 0.06%N2/H2 and 6%N2/H2 mixtures, respectively. N2 addition also leads to some spatial redistribution of the averaged reduced electric fields |E|/(N×a) [38] (with the factor a = (1+ω 2 /veff 2 ) 0.5 for the MW frequency ω = 2π×2.45 GHz) in the near substrate region (Figure 3(a)), of the absorbed power density, PD, (in favour of the near substrate region and to a lesser extent the plasma core, Figure 3(a))…”
Section: N/h Plasma Modelingmentioning
confidence: 99%
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