Combined scanning microwave and electron microscopy: A novel toolbox for hybrid nanoscale material analysis

Haddadi, Kamel; Haenssler, Olaf C.; Daffe, K.; Eliet, Sophie; Boyaval, Christophe; Théron, D.; Dambrine, G.

doi:10.1109/imws-amp.2017.8247419

Cited by 6 publications

(3 citation statements)

References 9 publications

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“…The instrumentation developed incorporates 3 imaging modes (topography, radiofrequency and electronic) that can be run individually or simultaneously. Preliminary developments have been presented in [34][35][36][37][38]. Consequently, this section provides an overview of the modes of implementation to help the reader.…”

Section: Description Of the Scanning Microwave Microscope Built Inside A Scanning Electron Microscopementioning

confidence: 99%

“…There is an urgent need to develop SMM traceability to yield quantitative and calibrated data. In this effort, we developed a SMM operating inside a scanning electron microscope (SEM) using a microstrip probe structure operating up to 67 GHz [34][35][36][37][38]. Our previous works were completed by first presenting quantitative data performed at 30 GHz on microsized metal oxide semiconductor (MOS) capacitors.…”

Section: Introductionmentioning

confidence: 99%

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Near-Field Scanning Millimeter-Wave Microscope Operating Inside a Scanning Electron Microscope: Towards Quantitative Electrical Nanocharacterization

et al. 2021

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The main objectives of this work are the development of fundamental extensions to existing scanning microwave microscopy (SMM) technology to achieve quantitative complex impedance measurements at the nanoscale. We developed a SMM operating up to 67 GHz inside a scanning electron microscope, providing unique advantages to tackle issues commonly found in open-air SMMs. Operating in the millimeter-wave frequency range induces high collimation of the evanescent electrical fields in the vicinity of the probe apex, resulting in high spatial resolution and enhanced sensitivity. Operating in a vacuum allows for eliminating the water meniscus on the tip apex, which remains a critical issue to address modeling and quantitative analysis at the nanoscale. In addition, a microstrip probing structure was developed to ensure a transverse electromagnetic mode as close as possible to the tip apex, drastically reducing radiation effects and parasitic apex-to-ground capacitances with available SMM probes. As a demonstration, we describe a standard operating procedure for instrumentation configuration, measurements and data analysis. Measurement performance is exemplarily shown on a staircase microcapacitor sample at 30 GHz.

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Section: Description Of the Scanning Microwave Microscope Built Inside A Scanning Electron Microscopementioning

confidence: 99%

Section: Introductionmentioning

confidence: 99%

Near-Field Scanning Millimeter-Wave Microscope Operating Inside a Scanning Electron Microscope: Towards Quantitative Electrical Nanocharacterization

et al. 2021

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“…Indeed, water meniscus in the vicinity of the probe tip and material surface alter the measurement quality and remains difficult to be modelled accurately [11]. In this effort, a novel instrumentation has been thought and built from scratch [12]- [13]. The instrumentation has been designed to operate inside a scanning electron microscope (SEM) for environment control and water meniscus elimination [14]- [15].…”

Section: Introductionmentioning

confidence: 99%

Operation of Near-Field Scanning Millimeter-wave Microscopy up to 67 GHz under Scanning Electron Microscopy Vision

Polovodov

Théron

Eliet

et al. 2020

2020 IEEE/MTT-S International Microwave Symposium (IMS)

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A near-field scanning millimeter-wave microscope is developed with broadband capabilities up to 67 GHz. The instrumentation has been designed to operate inside a scanning electron microscope for environment control and water meniscus elimination. Scanning electron microscopy imaging of the tip / sample interaction gives the unique possibility to limit the scan area and preserve the integrity of the probe tip. In addition, hybrid imaging considering simultaneously atomic, microwave and electron microscopy tools is beneficial for further modeling to address the quantitative characterization of nanomaterials. Experimental data are exemplary shown to demonstrate the viability of the solution proposed.

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Impact of GSG Probe to Pads Contact Repeatability for On-Wafer RF Measurements

Mokhtari

Sebbache

Avramovic

et al. 2021

2021 IEEE 7th International Conference on Smart Instrumentation, Measurement and Applications (ICSIMA)

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Improving the contact repeatability for on-wafer measurements is required to address accurate characterization of microwave and millimeter-wave extreme impedance devices foreseen in future RF semi-conductor industry. In this effort, residual error terms introduced by conventional on-wafer probe measurements are quantified in the frequency range 50 MHz -67 GHz. In particular, two sets of measurements considering movements of the probes in the Z-direction only and in X-Y-Z directions are considered. Controlling the probe in the XY axis showed better results in terms of repeatability, more than 10 times à 10 GHz and more than 5 times à 60 GHz. The residual error terms are propagated to determine the measurement uncertainty on the complex impedance of capacitances theoretically tested. Capacitance value of 1 fF measured at 10 GHz was measured with an error around 80 %. Moving the probe on the Z-direction only demonstrated that, if the X and Y movements of the probe are theoretically controlled, the error could be reduced to ~7%. In addition, preliminary design and fabrication of a new compact on-wafer probe station built up with nanorobotics is proposed. Both chuck and RF probes are equipped with nano-positioning stages operating in close loop operation.

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Combined scanning microwave and electron microscopy: A novel toolbox for hybrid nanoscale material analysis

Cited by 6 publications

References 9 publications

Near-Field Scanning Millimeter-Wave Microscope Operating Inside a Scanning Electron Microscope: Towards Quantitative Electrical Nanocharacterization

Near-Field Scanning Millimeter-Wave Microscope Operating Inside a Scanning Electron Microscope: Towards Quantitative Electrical Nanocharacterization

Operation of Near-Field Scanning Millimeter-wave Microscopy up to 67 GHz under Scanning Electron Microscopy Vision

Impact of GSG Probe to Pads Contact Repeatability for On-Wafer RF Measurements

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