2009
DOI: 10.1002/pssb.200844347
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Combinatorial growth of Mgx Zn1–xO epilayers by chemical vapor deposition

Abstract: It was our aim to explore the growth of Mgx Zn1–x O epilayers on ZnO substrates using CVD at substrate temperatures around 650 °C which is considerably lower than necessary for the MOCVD growth which requires substrate temperatures above 900 °C. Metallic precursors (Zn, Mg) were used together with NO2 as oxygen precursor. The Mg content was determined from the shift of longitudinal optical phonon line as a function of the Mg composition. The properties of the films were investigated by low temperature photolum… Show more

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Cited by 5 publications
(4 citation statements)
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References 14 publications
(28 reference statements)
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“…Lautenschlaeger et al [249] reported the growth of MgZnO epilayers on ZnO single-crystal substrates using chemical vapor deposition at relatively low temperatures of ∼650 • C, without using organometallic precursors. Instead, they used metallic precursors (Zn, Mg) along with NO 2 as an oxygen precursor.…”
Section: Synthesis and Characterization Of Mgzno And Cdzno Alloysmentioning
confidence: 99%
See 1 more Smart Citation
“…Lautenschlaeger et al [249] reported the growth of MgZnO epilayers on ZnO single-crystal substrates using chemical vapor deposition at relatively low temperatures of ∼650 • C, without using organometallic precursors. Instead, they used metallic precursors (Zn, Mg) along with NO 2 as an oxygen precursor.…”
Section: Synthesis and Characterization Of Mgzno And Cdzno Alloysmentioning
confidence: 99%
“…Instead, they used metallic precursors (Zn, Mg) along with NO 2 as an oxygen precursor. Epitaxial films with fixed Mg concentrations were found to require an individual adjustment of the Mg reservoir temperature, allowing Lautenschlaeger et al to explore the possibility of achieving a Mg gradient within one sample in a combinatorial approach using chemical vapor deposition [249].…”
Section: Synthesis and Characterization Of Mgzno And Cdzno Alloysmentioning
confidence: 99%
“…75 Combinatorial studies explored the composition spreads of MZO with different deposition methods, such as pulsed laser deposition 77,78 and chemical vapor deposition. 79 In a previous combinatorial study, we showed that the conduction band position could be tuned by 0.5 eV as Mg concentration changes from 4 to 12%, 80 suggesting that it might be a suitable contact to CuGa3Se5 absorber. Integration of MZO as contact material resulted in significant efficiency improvements of CdTe 81 and CIGS 82,83 65a).…”
Section: Combinatorial Development Of Buffer Materialsmentioning
confidence: 92%
“…There are varying reports on the Mg x Zn 1Àx O band gap (4.0-4.2 eV) at maximum Mg composition (x ¼ 0.36-0.46) at which phase segregation occurs, as it depends on the deposition technique, deposition rate, and substrate temperature. [8,9] Mg x Zn 1Àx O has also been studied using different combinatorial methods, such as pulsed laser deposition, [10] chemical vapor deposition, [11] and sputtering, [12] where we demonstrated Mg x Zn 1Àx O conduction band tuning and integrated it with wide-bandgap CuGa 3 Se 5 absorber to increase V OC close to %1 V. The Mg x Zn 1Àx O/ CdSe y Te 1Ày device interface was also recently studied, demonstrating improvements in J SC and efficiency due to widened bandgap and better carrier collection at low wavelengths. [13] Finding the optimum composition in Mg x Zn 1Àx O and CdSe y Te 1Ày is complicated as Mg in Mg x Zn 1Àx O and Se in CdSe y Te 1Ày both change the conduction band alignment and interface defect density, which can have significant impacts on interface recombination, barrier heights, and V OC.…”
Section: Introductionmentioning
confidence: 99%