2014
DOI: 10.1002/cvde.201307089
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CO2‐Laser Flash Evaporation as Novel CVD Precursor Delivery System for Functional Thin Film Growth

Abstract: A novel approach for functional thin film deposition using laser flash evaporation as the precursor delivery system is reported. In this newly established CO 2 -laser-assisted (LA)CVD, solid precursors with low volatility are non-selectively sublimated by absorption of infrared laser radiation. Thus, the method allows for the highly controlled growth of multicomponent thin films with desired composition and stoichiometry over the entire growth period. Thin film microstructural features, such as the morphology,… Show more

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Cited by 11 publications
(11 citation statements)
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References 30 publications
(35 reference statements)
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“…Formation of this compound was already observed in systems other than LLZO deposited by LA-CVD at elevated temperatures. 16 In an earlier study, 16 two ways to suppress the Li 2 PtO 3 phase formation in LA-CVD of LiCoO 2 were investigated, based on the reaction scheme:…”
Section: Resultsmentioning
confidence: 99%
See 1 more Smart Citation
“…Formation of this compound was already observed in systems other than LLZO deposited by LA-CVD at elevated temperatures. 16 In an earlier study, 16 two ways to suppress the Li 2 PtO 3 phase formation in LA-CVD of LiCoO 2 were investigated, based on the reaction scheme:…”
Section: Resultsmentioning
confidence: 99%
“…16 The only modification made to the setup described in Loho et al 16 is that a porous stainless steel microsieve R200 (Tridelta Siperm GmbH) was used in front of the sample holder to achieve a more uniform gas flow and hence deposition. As precursor materials for the LLZO thin film deposition, 2,2,6,6-tetramethyl-3,5-heptanedionato lithium (LiC 11 4 , Sigma Aldrich, 98%) were premixed inside an Ar-filled glove box (MBraun GmbH) with O 2 -and H 2 Olevels <1 ppm.…”
Section: Methodsmentioning
confidence: 99%
“…Li 6.5 La 3 Zr 1.5 Ta 0.5 O 12 (LLZTO) thin films were deposited by LASER-assisted chemical vapor deposition (LA-CVD) on Si wafers (CrysTec GmbH, Berlin Germany) with an orientation of (100). For a detailed description of the deposition setup please see previous publications of our group [ 18 ]. As precursors, 2,2,6,6-tetramethyl-3,5-heptanedionato lithium (LiC 11 H 19 O 2 , STREM Chemicals GmbH, Kehl, Germany, 98%), lanthanum(III) acetylacetonate hydrate (La(C 5 H 7 O 2 ) 3 ·4H 2 O, abcr GmbH, Karlsruhe, Germany, 99.9%), tantalum(V) tetraethoxyacetylacetonate (TaC 13 H 27 O 6 , STREM Chemicals GmbH, Kehl, Germany, 99.99%), and zirconium(IV) acetylacetonate (Zr(C 5 H 7 O 2 ) 4 , STREM Chemicals GmbH, Kehl, Germany, 98%) were mixed in stoichiometric ratio, with a 50 wt % excess of Li.…”
Section: Methodsmentioning
confidence: 99%
“…Different types of battery materials were shown to be successfully protected by applying thin layers using various modifications of CVD method, namely metal‐organic CVD, [ 174 ] laser flash evaporation CVD, [ 175 ] electron cyclotron resonance CVD. [ 176 ] CVD techniques have particular popularity in the context of all‐solid‐state LIBs, where the large polarization at the interface between Li metal anode and oxide‐based (garnet) solid electrolyte is a main challenge.…”
Section: Production Methods—advantages Challenges and Effectivenessmentioning
confidence: 99%