Co-sputtered Ru-Ti alloy electrodes for DRAM applications

Horng, Ray−Hua; Wu, L. H.; Sun, Wei; Chan, Shih‐Hsiung; Leu, Chyi‐Ming; Huang, Tiao‐Yuan; Sze, Simon M.; Lee, M.K.

doi:10.1016/s0040-6090(98)01699-x

Cited by 4 publications

(2 citation statements)

References 5 publications

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“…We have noted a sharp decrease in the deposition rate when the oxygen percentage increases. The decrease of the deposition rate as function of oxygen-argon is already observed on BST thins films [35,36]. This decrease can be explained by low the proportion of argon ions in the plasma or by the modification of the target surface in the presence of oxygen or both phenomena at the same time.…”

Section: Influence Of Oxygen Pressurementioning

confidence: 75%

Microstructural and optical properties tuning of BiFeO3 thin films elaborated by magnetron sputtering

Somrani

Maaloul

Saïdi

et al. 2015

J Mater Sci: Mater Electron

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Multiferroic BiFeO 3 thin films were deposited using a conventional RF magnetron sputtering technique on Si substrate. The influence of the microstructure of BiFeO 3 thin films on their optical properties was investigated through an extensive characterization. Using X-ray diffraction and atomic force microscopy, the structure and crystalline quality of the films were studied with regard to the effect of oxygen partial pressure during the deposition and to post annealing treatment. Stoichiometric films with the crystallographic perovskite structure required for multiferroic behaviour were obtained. It is demonstrated that films annealed at 700°C in oxygen at atmospheric pressure are highly (100) perovskite orientated and free of the undesired phases. This perovskite phase is observed only for a narrow range of oxygen partial pressure The refractive index and extinction coefficient were obtained using variable angle spectroscopic ellipsometry. The optical characteristics of the films are directly correlated to their microstructural properties. Ellipsometry analysis showed that we can tune the optical constants of BiFeO 3 films by controlling the oxygen partial pressure during deposition.

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Section: Influence Of Oxygen Pressurementioning

confidence: 75%

Microstructural and optical properties tuning of BiFeO3 thin films elaborated by magnetron sputtering

Somrani

Maaloul

Saïdi

et al. 2015

J Mater Sci: Mater Electron

View full text Add to dashboard Cite

show abstract

“…doi:10.1016/j.susc.2005.08.001 TiO 2 are the preferred ones, as it is expected that the resulting materials will show the catalytic properties of Ru and the well-known corrosion resistance properties of Ti (and TiO 2 ). Such Ru-RuO 2 -Ti-TiO 2 systems have been studied as electrocatalysts for H 2 and O 2 gas evolution [1,2], organic compounds electro-oxidation [3][4][5], and even electrodes for microcircuitry [6]. All these applications require stable, corrosion-resistant materials.…”

Section: Introductionmentioning

confidence: 99%