Microstructural and optical properties tuning of BiFeO3 thin films elaborated by magnetron sputtering

Abstract

Multiferroic BiFeO 3 thin films were deposited using a conventional RF magnetron sputtering technique on Si substrate. The influence of the microstructure of BiFeO 3 thin films on their optical properties was investigated through an extensive characterization. Using X-ray diffraction and atomic force microscopy, the structure and crystalline quality of the films were studied with regard to the effect of oxygen partial pressure during the deposition and to post annealing treatment. Stoichiometric films with the crystallographic perovskite structure required for multiferroic behaviour were obtained. It is demonstrated that films annealed at 700°C in oxygen at atmospheric pressure are highly (100) perovskite orientated and free of the undesired phases. This perovskite phase is observed only for a narrow range of oxygen partial pressure The refractive index and extinction coefficient were obtained using variable angle spectroscopic ellipsometry. The optical characteristics of the films are directly correlated to their microstructural properties. Ellipsometry analysis showed that we can tune the optical constants of BiFeO 3 films by controlling the oxygen partial pressure during deposition.

Performance Enhancement of Polycrystalline Silicon Solar Cell through Sputter Coated Molybdenum Disulphide Surface Films

“…Then the solar cell and the prepared solid target were loaded in the substrate and target holder. The reactor used in the deposition process is RF magnetron sputtering reactor [17]. Sputter power of 250 W was supplied to the target material which is a place at the argon atmosphere.…”

Deposition parameters and annealing key role in setting structural and polar properties of Bi0.9La0.1Fe0.9Mn0.1O3 thin films

“…Somrani et al showed that both partial oxygen pressure and annealing treatment play a key role on the formation of the crystalline phase. These authors obtained high (100)-oriented BFO films on Si substrate at 700 °C and atmospheric pressure for a deposition time of 1 h [6].…”

Láminas delgadas de materiales multiferroicos basados en BiFeO3 procesadas en medio acuoso

“…fin en el sputtering convencional a menudo no es suficiente. Autores como Somrani et al[165] la han utilizado consiguiendo láminas de BiFeO 3 libre de fases secundarias y con interesantes propiedades ópticas, aunque requirieron de una calcinación a 700 ºC posterior a la deposición. De cualquier modo, es importante añadir que la técnica no siempre ha dado resultados tan óptimos.…”