2013
DOI: 10.1002/pssr.201308055
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Co‐diffusion from solid sources for bifacial n‐type solar cells

Abstract: We present a simplified process sequence for the fabrication of large area n-type silicon solar cells. The boron emitter and full area phosphorus back surface field are formed in one single high temperature step using doped glasses deposited by plasma enhanced chemical vapour deposition (PECVD) as diffusion sources. By optimizing the gas composition during the PECVD process, we not only prevent the formation of a boron rich layer (BRL), but also achieve doping profiles that exhibit a low dark saturation curren… Show more

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Cited by 13 publications
(4 citation statements)
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“…This demonstrates the possibility for a sig­nif­i­cant simplification of the fab­ri­ca­tion pro­cess for n‐HIP‐MWT+ solar cells by in­te­gra­ting a laser struc­turing process for the phos­pho­rus‐doped BSF. This approach is also compatible with other ap­proach­es to form the high­ly doped surfaces, as e.g., co‐dif­fu­sion or implantation. On the oth­er hand, also the ob­served loss in η = −0.3% abs for the n‐HIP‐MWT cell struc­ture remains within reasonable bounds.…”
Section: Resultsmentioning
confidence: 85%
“…This demonstrates the possibility for a sig­nif­i­cant simplification of the fab­ri­ca­tion pro­cess for n‐HIP‐MWT+ solar cells by in­te­gra­ting a laser struc­turing process for the phos­pho­rus‐doped BSF. This approach is also compatible with other ap­proach­es to form the high­ly doped surfaces, as e.g., co‐dif­fu­sion or implantation. On the oth­er hand, also the ob­served loss in η = −0.3% abs for the n‐HIP‐MWT cell struc­ture remains within reasonable bounds.…”
Section: Resultsmentioning
confidence: 85%
“…There have been many studies on co-diffusion of boron and phosphorus to resolve the many steps of boron diffusion. Rothhardt et al studied co-diffusion from BSG and phosphorus doped glass, (PSG), deposited by plasma enhanced chemical vapor deposition (PECVD), and Meier et al used BSG deposited by atmospheric pressure chemical vapor deposition (APCVD) and POCl 3 gas ambient as a doping source [12][13][14]. These methods reduced diffusion steps compared with conventional boron diffusion using BBr 3 gas, but they are still complicated methods due to BSG deposition.…”
Section: Introductionmentioning
confidence: 99%
“…Recent research has focused on the formation process of PECVD silicate glass emitters , monitoring the quality of these PECVD emitters , co‐diffusion processes with PECVD emitters , contacting of these emitters , passivation through the same BSG layer , and the fabrication of solar cells using PECVD silicate glass . Solar cell efficiencies of above 20% have been achieved with PECVD silicate glass processes for n‐type small area back junction IBC cell concepts , large area back junction , and front junction bifacial solar cell concepts .…”
Section: Introductionmentioning
confidence: 99%