1990
DOI: 10.1109/23.101223
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CMOS/SOI hardening at 100 Mrad (SiO/sub 2/)

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Cited by 71 publications
(9 citation statements)
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“…This technology has already demonstrated its ability to withstand TID in the 10 kGy (Mrad) range combined to very low power consumption needed for stand-alone applications. SOI/SOS technologies, either with a thick or with a partially depleted active silicon layer [10]- [12], can withstand high TID levels. In this paper, a 0.13 m PDSOI technology is studied to investigate whether or not the TID induced charge trapping in the buried oxide (BOX) is an intrinsic limitation for use in MGy dose environments.…”
Section: B Devicesmentioning
confidence: 99%
“…This technology has already demonstrated its ability to withstand TID in the 10 kGy (Mrad) range combined to very low power consumption needed for stand-alone applications. SOI/SOS technologies, either with a thick or with a partially depleted active silicon layer [10]- [12], can withstand high TID levels. In this paper, a 0.13 m PDSOI technology is studied to investigate whether or not the TID induced charge trapping in the buried oxide (BOX) is an intrinsic limitation for use in MGy dose environments.…”
Section: B Devicesmentioning
confidence: 99%
“…The buried oxide isolation and the small volume of silicon present many advantages for speed, density, and transient irradiation [4]. But, unless radiation hardened [5], the buried oxide also induces total dose leakage currents [6].…”
Section: Introductionmentioning
confidence: 99%
“…Moreover, the latest CMOS technologies are available either in bulk or SOI processes. In [5], for the same feature size, bulk CMOS has been found more radiation-resistant than SOI. The effects due to ionizing radiation can hence be reduced by choosing an advanced bulk technology.…”
Section: Introductionmentioning
confidence: 99%
“…Only a few papers have indeed been dedicated to the effects in electronic devices at very high TID [5]- [8]. Moreover, to our knowledge, none have been published about the combination of high dose on nanoscale CMOS technology, especially 28 nm bulk CMOS.…”
Section: Introductionmentioning
confidence: 99%