CMOS-compatible highly efficient polarization splitter and rotator based on a double-etched directional coupler

Guan, Hang; Novack, Ari; Streshinsky, Matthew; Shi, Ruizhi; Qing, Feng‐Ling; Lim, Andy Eu-Jin; Lo, Guo‐Qiang; Baehr‐Jones, Tom; Hochberg, Michael

doi:10.1364/oe.22.002489

Cited by 78 publications

(32 citation statements)

References 18 publications

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“…Integration with silicon photonic elements: Another promising direction is integrating plasmonic devices with silicon photonics. Silicon photonic devices that share the commercial complementary metal-oxide semiconductor (CMOS) chip fabrication facilities have witnessed fast development in recent years [140][141][142][143] and will be very likely commercialized in the near future. The silicon photonic devices do not suffer much from absorption losses; however, it is limited by their sizes due to the diffraction limit.…”

Section: Perspectivesmentioning

confidence: 99%

Light manipulation with encoded plasmonic nanostructures

2014

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-Plasmonics, which allows for manipulation of light field beyond the fundamental diffraction limit, has recently attracted tremendous research efforts. The propagating surface plasmon polaritons (SPPs) confined on a metal-dielectric interface provide an ideal two-dimensional (2D) platform to develop subwavelength optical circuits for on-chip information processing and communication. The surface plasmon resonance of rationally designed metallic nanostructures, on the other hand, enables pronounced phase and polarization modulation for light beams travelling in three-dimensional (3D) free space. Flexible 2D and free-space propagating light manipulation can be achieved by encoding plasmonic nanostructures on a 2D surface, promising the design, fabrication and integration of the nextgeneration optical architectures with substantially reduced footprint. It is envisioned that the encoded plasmonic nanostructures can significantly expand available toolboxes for novel light manipulation. In this review, we presents the fundamentals, recent developments and future perspectives in this emerging field, aiming to open up new avenues to developing revolutionary photonic devices.

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Section: Perspectivesmentioning

confidence: 99%

Light manipulation with encoded plasmonic nanostructures

2014

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“…High refractive index contrast makes silicon waveguides highly polarization dependent. To address this issue, various types of passive polarization management components have been reported recently, including polarization splitters [2,3], rotators [4][5][6][7][8][9][10] and polarizers [11][12][13][14][15][16]. Among them, polarizers which simply filter the undesired polarization state are suitable for many applications.…”

Section: Introductionmentioning

confidence: 99%

High Extinction Ratio and Broadband Silicon TE-Pass Polarizer Using Subwavelength Grating Index Engineering

Xiong

Schmid

et al. 2015

IEEE Photonics J.

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/npsi/ctrl?lang=en http://nparc.cisti-icist.nrc-cnrc.gc.ca/npsi/ctrl?lang=fr READ THESE TERMS AND CONDITIONS CAREFULLY BEFORE USING THIS WEBSITE.http://nparc.cisti-icist.nrc-cnrc.gc.ca/npsi/jsp/nparc_cp.jsp?lang=en Vous avez des questions? Nous pouvons vous aider. Pour communiquer directement avec un auteur, consultez la première page de la revue dans laquelle son article a été publié afin de trouver ses coordonnées. Si vous n'arrivez pas à les repérer, communiquez avec nous à PublicationsArchive-ArchivesPublications@nrc-cnrc.gc.ca. Questions?Contact the NRC Publications Archive team at PublicationsArchive-ArchivesPublications@nrc-cnrc.gc.ca. If you wish to email the authors directly, please see the first page of the publication for their contact information. NRC Publications Archive Archives des publications du CNRCThis publication could be one of several versions: author's original, accepted manuscript or the publisher's version. / La version de cette publication peut être l'une des suivantes : la version prépublication de l'auteur, la version acceptée du manuscrit ou la version de l'éditeur. For the publisher's version, please access the DOI link below./ Pour consulter la version de l'éditeur, utilisez le lien DOI ci-dessous. This article has been accepted for publication in a future issue of this journal, but has not been fully edited. Content may change prior to final publication. We propose and experimentally demonstrate a novel approach to implement a low loss, broadband and compact transverse electric (TE)-pass polarizer on a silicon-on-insulator (SOI) platform. The TE-polarizer utilizes a subwavelength grating (SWG) structure to engineer the waveguide equivalent material index. In this work, the SWG-based polarizer only supports its fundamental TE mode while the transverse magnetic (TM) mode is suppressed under the cut-off condition, i.e., the TM mode leaks from the waveguide with a low reflection. The simulations predict that the bandwidth to achieve a polarization extinction ratio (ER) of 35 dB exceeds 200 nm. Experimentally, the measured polarization ER is ~30 dB and the average insertion loss is 0.4 dB, in the wavelength range 1470 nm -1580 nm. The fabricated TE-polarizer has a compact length of 60 µm.

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“…Particularly in recent years, the booming silicon photonic transmitters and receivers for 100 Gb/s coherent optical communication requires a robust polarization diversity scheme which should have a large fabrication tolerance and ensure a high manufacture yield because of the high cost of this complex silicon photonic module [13][14][15][16]. Various structures have been reported based on asymmetric directional couplers (DCs) [17][18][19][20][21][22] and Y-junctions [23] so far. However, most of these previously reported DC-based PSRs require strict phase matching conditions and thus the performances are usually sensitive to the size deviation due to the imperfect fabrication process [17][18][19][20][21][22].…”

Section: Introductionmentioning

confidence: 99%

“…Various structures have been reported based on asymmetric directional couplers (DCs) [17][18][19][20][21][22] and Y-junctions [23] so far. However, most of these previously reported DC-based PSRs require strict phase matching conditions and thus the performances are usually sensitive to the size deviation due to the imperfect fabrication process [17][18][19][20][21][22]. The PSR based on mode-evolution Y-junctions has a considerably large bandwidth, but a low-loss asymmetric Y-junction is difficult to achieve in practice [23].…”

Section: Introductionmentioning

confidence: 99%

Proposal for fabrication-tolerant SOI polarization splitter-rotator based on cascaded MMI couplers and an assisted bi-level taper

Wang

Xuan

et al. 2014

Opt. Express

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Abstract:A novel silicon-on-insulator (SOI) polarization splitter-rotator (PSR) with a large fabrication tolerance is proposed based on cascaded multimode interference (MMI) couplers and an assisted mode-evolution taper. The tapers are designed to adiabatically convert the input TM 0 mode into the TE 1 mode, which will output as the TE 0 mode after processed by the subsequent MMI mode converter, 90-degree phase shifter (PS) and MMI 3 dB coupler. The numerical simulation results show that the proposed device has a < 0.5 dB insertion loss with < −17 dB crosstalk in C optical communication band. Fabrication tolerance analysis is also performed with respect to the deviations of MMI coupler width, PS width, slab height and upper-cladding refractive index, showing that this device could work well even when affected by considerable fabrication errors. With such a robust performance with a large bandwidth, this device offers potential applications for CMOS-compatible polarization diversity, especially in the booming 100 Gb/s coherent optical communications based on silicon photonics technology. Shastri, "112Gb/s DP-QPSK transmission over 2427km SSMF using small-size silicon photonic IQ modulator and low-power CMOS

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CMOS-compatible highly efficient polarization splitter and rotator based on a double-etched directional coupler

Cited by 78 publications

References 18 publications

Light manipulation with encoded plasmonic nanostructures

Light manipulation with encoded plasmonic nanostructures

High Extinction Ratio and Broadband Silicon TE-Pass Polarizer Using Subwavelength Grating Index Engineering

Proposal for fabrication-tolerant SOI polarization splitter-rotator based on cascaded MMI couplers and an assisted bi-level taper

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