ChemInform Abstract: Sintering and Electrical Properties of Titania‐ and Zirconia‐ Containing In2O3‐SnO2 (ITO) Ceramics.

Abstract

ChemInform is a weekly Abstracting Service, delivering concise information at a glance that was extracted from about 100 leading journals. To access a ChemInform Abstract of an article which was published elsewhere, please select a “Full Text” option. The original article is trackable via the “References” option.

Modified Pechini Synthesis of Oxide Powders and Thin Films

“…ITO thin films are industrially prepared by sputtering, where targets with high density are required (Gehman et al 1992). It has been known for decades that it is difficult to obtain In2O3 and ITO with high density (Vojnovich and Bratton 1975;Nadaud et al 1994), which has caused a considerable interest in the synthesis and sintering of nano-crystalline In2O3 and ITO.…”

Preparation of Fluorine‐Containing Indium Tin Oxide Sputtering Targets using Spark Plasma Sintering Process

“…In this process, ITO films are deposited using either metallic In–Sn alloy targets or In 2 O 3 –SnO 2 oxide targets. Several studies have reported that oxide targets are easier to use than alloy targets because of its lower sensitivity to minor changes in operating parameters, such as oxygen flow rate, during sputtering 3,5–7 . Properties of the sputtering targets strongly affect the sputtering efficiency and quality of the sputtered films 5,7 .…”

“…Several studies have reported that oxide targets are easier to use than alloy targets because of its lower sensitivity to minor changes in operating parameters, such as oxygen flow rate, during sputtering 3,5–7 . Properties of the sputtering targets strongly affect the sputtering efficiency and quality of the sputtered films 5,7 . Dense targets are advantageous for increasing deposition rates and exhibiting a more stable resistivity of the deposited films 5 …”

“…However, there have been few reports on the preparation of high‐density fluorine‐containing ITO (F‐ITO) targets. This is partly because of the poor sinterability of ITO; for preparing dense ITO ceramics, higher sintering temperatures (>1350°C) are generally required 7,11 . At such higher temperatures, fluorine would sublimate from the sintered body, even when it is initially contained.…”

“…At such higher temperatures, fluorine would sublimate from the sintered body, even when it is initially contained. Addition of small amounts of SiO 2 or TiO 2 enhances the density of ITO ceramics, but these additives reduce the conductivity of the deposited films when they are incorporated from the targets 5,7 . Therefore, preparation of dense F‐ITO ceramics without any additives is required, particularly for relatively large‐sized disks in excess of 7.62 cm (3 in.)…”