1973
DOI: 10.1002/chin.197329048
|View full text |Cite
|
Sign up to set email alerts
|

ChemInform Abstract: ELECTROLESS DEPOSITION OF NICKEL‐BORON ALLOYS, MECHANISM OF PROCESS, STRUKTURE AND SOME PROPERTIES OF DEPOSITS

Abstract: Ni‐B‐Legierungen wurden stromlos aus Lösungen abgeschieden, die ein Ni‐Salz (NiCIQ ), NaBH4 als Reduktionsmittel, NaOH, einen Komplexbildner ( ;z.B. Äthylendiamin) und einen Stabilisator ( ;z.B. TlNO3, PbCl2 oder 2‐Mercaptobenzothiazol) enthalten.

Help me understand this report

Search citation statements

Order By: Relevance

Paper Sections

Select...
2
1
1

Citation Types

0
3
0

Year Published

2008
2008
2011
2011

Publication Types

Select...
3

Relationship

0
3

Authors

Journals

citations
Cited by 3 publications
(4 citation statements)
references
References 1 publication
0
3
0
Order By: Relevance
“…There have been several propositions regarding the reaction mechanism of electroless Ni-B coatings but one of the mechanisms proposed by Gorbunova, Ivanov, and Moiseev (1973) is well supported by experimental evidence. The proposed scheme for the reaction mechanism of nickel boron plating consists of mainly three steps:…”
Section: Experimental Details Coating Proceduresmentioning
confidence: 98%
“…There have been several propositions regarding the reaction mechanism of electroless Ni-B coatings but one of the mechanisms proposed by Gorbunova, Ivanov, and Moiseev (1973) is well supported by experimental evidence. The proposed scheme for the reaction mechanism of nickel boron plating consists of mainly three steps:…”
Section: Experimental Details Coating Proceduresmentioning
confidence: 98%
“…It was justified that the electroless deposition of Ni-P and Ni-B alloys could be successfully used in piezoengineering, microelectronics and so on (1)(2)(3)(4)(5)(6)(7)(8)(9)(10)(11)(12)(13)(14)(15)(16)(17)(18)(19)(20). For development of the optimum technology, we improved the entire cycle of the metallization process: the preliminary treatment of various substrates (sensitization and activation), the composition of solutions and the parameters of electroless deposition, the parameters of heat treatment after deposition, the conditions of photolithography, the selective etching processes, etc.…”
Section: Some Data On the Mechanism Of Activation And Sensitizationmentioning
confidence: 99%
“…The advantages of electroless deposition of metals and alloys are the following: a possibility of obtaining the coating of uniform thickness on arbitrary shaped-surfaces, good solderability, sufficient chemical resistance, high hardness and wear resistance, a possibility of varying the mechanical properties and electrical conductivity of the films in a wide range. Hence, this opens up new avenues for wide application of electrolessly deposited films (1)(2)(3)(4)(5)(6)(7)(8)(9)(10)(11)(12)(13)(14)(15)(16)(17)(18)(19)(20).…”
Section: Introductionmentioning
confidence: 99%
“…At adding HCl (1 milliliter of concentrated acid per gram of PdCl 2 .2H 2 O), chloropalladic acid is formed according to the reaction: 2 HCl + PdCl 2 = H 2 PdCl 4 , [6] which affects favorably the activation process.…”
Section: The Mechanism Of Reactions Of Hypophosphite Oxidation and El...mentioning
confidence: 99%