Chemical vapor infiltration method for deposition of gold nanoparticles on porous alumina supports

Oxygen-free precursor for chemical vapor deposition of gold films: thermal properties and decomposition mechanism

“…To manufacture goldcontaining films, chemical vapor deposition (CVD) is a promising method allowing preparation of conformal coatings on different types of substrates with effective control of morphology of the forming films [9][10][11][12][13]. Thermolysis of the vapors of complex compounds of the metal with organic ligands on a substrate underlies the method of metallorganic CVD.…”

“…Various volatile gold compounds have been investigated as gold CVD precursors. These mainly include substituted phosphine complexes of alkylgold(I) [13,14], trifluorophosphine gold(I) chloride [15], dimethylgold (III) derivatives of β-diketonates [10], carboxylates [11], and salicylaldimines [12]. Dimethylgold(III) β-diketonate derivatives have been the objects of our investigations for a long time: we developed synthesis techniques, established crystal structures, and evaluated the thermal properties of the compounds [16][17][18][19].…”

Synthesis, crystal structure and thermal behavior of dimethylgold(III) derivatives of salicylaldimine Schiff bases – Novel precursors for gold MOCVD applications

“…Other applications include use gold nanoparticles as catalytic systems for epoxidation of propylene, and CO oxidation at low temperature when deposited with high dispersion on the surface of TiO 2 , Fe 2 O 3 , and Al 2 O 3 [9][10][11][12]. Moreover, catalytic activity of Au catalysts strongly depends on formation conditions and particle size [13][14][15].…”

“…Chemical vapour deposition of volatile organometallic compounds is widely used for formation of metallic and oxide coatings on different substrates. Depositions on surfaces of solids with highly developed porous structures are being considered as a valuable method for the preparation of catalysts with high dispersion of active components [10]. Besides that, the MOCVD method allows effective control of the size of the forming gold particles [10].…”

“…Depositions on surfaces of solids with highly developed porous structures are being considered as a valuable method for the preparation of catalysts with high dispersion of active components [10]. Besides that, the MOCVD method allows effective control of the size of the forming gold particles [10]. However, the study of gold MOCVD processes has been somewhat limited by the lack of suitable precursors [7].…”