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Rhodium, palladium, iridium, and platinum are deposited by means of metal-organic (MO)CVD using metal beta-diketonates as precursors. Under some conditions, the microstructure of the deposited metals changes from compact to columnar. The potential causes of structural changes are investigated and a mechanism of contamination is proposed, based on the observation of growth singularities. Several Rh, Pd, Ir, and Pt coatings are analyzed using scanning electron microscopy (SEM), transmission electron microscopy (TEM), high-resolution (HR)TEM, energy dispersive X-ray (EDX), and Gratan™ image filter (GIF) in order to observe composition, structure, and to identify the source of eventual structural changes.

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The mechanisms of pyrolysis in He and reduction in H 2 of a Ni(ktfaa) 2 chelate and nickel film deposition on copper substrates are discussed. The Ni films produced by CVD with the Ni(ktfaa) 2 chelate as a precursor are continuous. Pyrolysis of the Ni(ktfaa) 2 chelate takes place above 300 C. The hydrogen atmosphere allows the reaction temperature to be decreased to 213 C, but the film deposition rate is low. 300 C is the optimal temperature for continuous Ni film deposition on Cu substrates. The mechanism of hydrogen interaction with the adsorbed Ni(ktfaa) 2 chelate is discussed.