Chemical Vapor Deposition of Gold and Silver

Chemistry of gold(I, III) complexes with organic ligands as potential MOCVD precursors for fabrication of thin metallic films and nanoparticles

“…Trialkyl-and triphenylphosphines are good stabilizers of trimethylgold(III) [90]. ; some of those derivatives are considered as promising precursors for MOCVD of film materials [93]. Generally speaking, the approaches used for the synthesis of trialkylderivatives of gold(III) through alkyllithium in substitution reactions can be used for the preparation of fluorosubstituted complexes [94].…”

“…One of the most studied class of volatile compounds of dimethylgold(III) is its complexes with β-diketonates [93]. Dimethylgold(III) acetylacetonate was the first complex among this suggested the model of spatial crystal structure of Me 2 Au(tox) ( Fig.…”

“…Among gold complexes potentially applicable for MOCVD processes, compounds containing alkyloxy groups should be noted. Kodas et al [93] pointed out that such compounds could be good candidates for MOCVD of thin gold films. The first work reporting the synthesis and properties of complexes 1 and 2 (Fig.…”

“…Precursors for CVD and ALD processes meet some common requirements; these are volatility and thermal stability of the precursor; however, the two processes differ in their surface compounds for the formation of gold films nanomaterials [62,93,162]. The main classes of promising CVD precursors are shown in Fig.…”

“…UV- [170] or laser- [93,170] assisted CVD processes used for the deposition of gold coatings allow to decrease the deposition temperature. For instance, in the case of Me 3 AuPR 3 (R = Me, Et) and MeAuPMe 3 the deposition temperature was decreased to room temperature [170].…”