Promising new precursors for the CVD of gold

Abstract

High deposition rates for the CVD of gold at low temperatures are reported. The synthesis and use of methyl(alkyldimethoxyphosphine)gold(I) compounds in the chemical vapor deposition of gold (see Figure) is described, and the precursors are found to be easily handled in air, and to result in comparable deposition rates and higher yields compared to currently used materials. magnified image

Controlling the Thermal Stability and Volatility of Organogold(I) Compounds for Vapor Deposition with Complementary Ligand Design

“…Data collection, unit cell refinement, data processing and multi‐scan absorption correction were applied using the APEX2 or APEX3 software packages. The structures were solved using SHELXT and all non‐hydrogen atoms were refined anisotropically with SHELXL using a combination of shelXle and OLEX2 graphical user interfaces. Unless otherwise noted, all hydrogen atom positions were idealized and ride on the atom to which they were attached.…”

“…Trimethylphosphine methylgold(I) ( 1a ) is reported to be stable as a neat liquid until 150 °C, at which point dissociation of trimethylphosphine occurs followed by bimolecular reductive elimination of ethane gas . However, on active metal surfaces this decomposition is known to occur as low as room temperature: the Au–PMe 3 bond dissociates on the surface, allowing bimolecular reductive elimination to take place , …”

Controlling Thermal Stability and Volatility of Organogold(I) Compounds for Vapor Deposition with Complementary Ligand Design

“…Data collection, unit cell refinement, data processing and multi-scan absorption correction were applied using the APEX2 [11] or APEX3 [12] software packages. The structures were solved using SHELXT [13] and all non-hydrogen atoms were refined anisotropically with SHELXL [14] using a combination of shelXle [15] and OLEX2 [16] graphical user interfaces. Unless otherwise noted, all hydrogen atom positions were idealized and ride on the atom to which they were attached.…”

“…[12] However, on active metal surfaces this decomposition is known to occur as low as room temperature: the Au-PMe 3 bond dissociates on the surface, allowing bimolecular reductive elimination to take place. [13,14] Given this, we focused on three complementary synthetic strategies to increase the thermal stability of Au(I) complexes. First, increasing the steric bulk of the anionic ligand should hinder the bimolecular reductive elimination pathway by preventing the association of adjacent surface-bound Au(I) species.…”

Single-step co-deposition of nanostructured tungsten oxide supported gold nanoparticles using a gold–phosphine cluster complex as the gold precursor

“…One concern in using these inorganic precursors for synthesis of catalytic metal particles is potential for incorporation of chlorine, which can poison the catalyst. Non-halide containing mononuclear gold–phosphine complexes, for instance [R–Au–PR 3 ] [11, 12] and [Me–Au–P(OMe) 2 R′] [13], are known CVD precursors for the deposition of gold films, and the molecular gold cluster [Au 9 (PPh 3 ) 8 ](NO 3 ) 3 has been used as a precursor to supported metallic Au particles via solution-phase impregnation [14], however the use of molecular gold clusters in CVD has not previously been reported.…”