Chemical Vapor Deposition of Ferroelectric Thin Films

Foster, C. M.

doi:10.1007/978-1-4615-6185-9_7

Cited by 4 publications

(2 citation statements)

References 72 publications

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“…These physical vapor deposition techniques yielded high‐quality oxide superconductor films just a few nanometers in thickness, 115–117 superlattices of superconducting oxides with atomic‐scale thickness control and abrupt interfaces, 110,118–126 and the construction of new oxide superconducting phases with atomic layer precision 76,127 . Chemical techniques including metal‐organic chemical vapor deposition (MOCVD) 128–143 and chemical solution deposition (CSD) 144–148 have also been adapted and applied to functional oxides, particularly ferroelectrics. In recent years, a growing cadre of researchers has applied these physical and chemical techniques with increasing precision to the growth of an ever‐broadening set of functional oxide materials.…”

Section: Synthesis Of Epitaxial Oxide Films By Pulsed‐laser Deposmentioning

confidence: 99%

A Thin Film Approach to Engineering Functionality into Oxides

Schlom

Chen

Pan

et al. 2008

Journal of the American Ceramic Society

486

358

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The broad spectrum of electronic and optical properties exhibited by oxides offers tremendous opportunities for microelectronic devices, especially when a combination of properties in a single device is desired. Here we describe the use of reactive molecular‐beam epitaxy and pulsed‐laser deposition to synthesize functional oxides, including ferroelectrics, ferromagnets, and materials that are both at the same time. Owing to the dependence of properties on direction, it is often optimal to grow functional oxides in particular directions to maximize their properties for a specific application. But these thin film techniques offer more than orientation control; customization of the film structure down to the atomic‐layer level is possible. Numerous examples of the controlled epitaxial growth of oxides with perovskite and perovskite‐related structures, including superlattices and metastable phases, are shown. In addition to integrating functional oxides with conventional semiconductors, standard semiconductor practices involving epitaxial strain, confined thickness, and modulation doping can also be applied to oxide thin films. Results of fundamental scientific importance as well as results revealing the tremendous potential of utilizing functional oxide thin films to create devices with enhanced performance are described.

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Section: Synthesis Of Epitaxial Oxide Films By Pulsed‐laser Deposmentioning

confidence: 99%

A Thin Film Approach to Engineering Functionality into Oxides

Schlom

Chen

Pan

et al. 2008

Journal of the American Ceramic Society

486

358

View full text Add to dashboard Cite

show abstract

“…In both cases, the stability is also improved by prohibiting oligomerization or decomposition because of moisture or oxygen influence . Their volatility and stability may be enhanced further by the use of adducts like tetraglymes and pmdeta [44] .…”

Section: Chemical Precursors and Delivery A) Precursor Chemistrymentioning

confidence: 99%