Chemical Vapor Deposition of Assorted Metals

Hampden‐Smith, Mark J.; Kodas, Toivo T.

doi:10.1002/9783527615858.ch8

Cited by 3 publications

(1 citation statement)

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“…The metal β-diketonates with chemical functionalities and toughness for light and heat have been applied to electroluminescence (EL) materials [1][2][3] and precursors of metallorganic chemical vapor deposition (MOCVD) for oxide materials. [4][5][6] Our recent study has focused on the application of the β-diketonates for the active materials of a redox-flow battery in use of leveling of electric power generated by natural energy such as wind power. However, the Vanadium redox-flow battery presently in operation 7 consisting of aqueous electrolytes (VO 2 + / VO 2+ for positive and V 3+ /V 2+ for negative electrolytes) suffers from low energy-efficiency because of the large over-voltage due to slow kinetics of the electron transfer (ET) especially of the VO 2+ /VO 2 + couple requiring oxygen transfer.…”

Section: Introductionmentioning

confidence: 99%

Enhancements in the Electron-Transfer Kinetics of Uranium-Based Redox Couples Induced by Tetraketone Ligands with Potential Chelate Effect

et al. 2007

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Acetylacetone shows dissociative electron transfer when it is complexed with metal ions. In an effort to improve the kinetics of electron transfer of uranium-based complexes for application to a redox-flow battery, improvement by dimerization of acetylacetone into tetraketones with potential chelate effect is examined and discussed quantitatively. For the monomer acetylacetone, electron transfer of uranium complexes reveals an ECE mechanism and an inner-sphere reaction on the electrode surface. By using tetraketones, 8-oxo-2,4,-12,14-tetraoxapentadecane and m-bis(2,4-dioxo-1-pentyl)benzene, the electron transfer of tetraketones with U(VI)/U(V) and U(IV)/U(III) shows rapid kinetics based on the E mechanism. In clear contrast to U(acac) 4 , the electrochemically reduced species of the U(IV) complex with tetraketone is stable during potential cycling. These results are also supported by NMR of tetraketones with U(VI) and U(IV); each acetylacetone site to uranium atom is stable at -40 ∼ +40 °C. The results demonstrate a remarkable enhancement of the stability of the reduced form of the metal center and thereby an improvement of the redox kinetics by the chelate effect. The tetraketones are eminently suitable for use in the active materials of a high-efficiency redox-flow battery.

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Section: Introductionmentioning

confidence: 99%

Enhancements in the Electron-Transfer Kinetics of Uranium-Based Redox Couples Induced by Tetraketone Ligands with Potential Chelate Effect

et al. 2007

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Molybdenum Compounds without CO or Isonitrile Ligands

Flower

2007

Comprehensive Organometallic Chemistry III

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Investigation and Characterization of Thin Mocvd Copper Films From Pyrazolylborato - Copper (I) Complexes

Plappert¹,

Dahmen²,

Bergh

et al. 1994

MRS Proc.

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Thin copper layers were prepared via MOCVD from volatile pyrazolylborato - copper (I) complexes.Experiments involved chemical vapour deposition in a low pressure reactor between 150 - 350°C in H2/N2/He mixtures were carried out.Substrate temperature, source temperature and gas composition were varied to obtain the optimum growth rate.The copper layers were characterized by optical microscopy and scanning electron microscopy, XRD, and WDX. The metallic nature of the deposited films was proved by a four - point - probe measurement of the electrical resistivity.A selective deposition on metal seeded surface sites was observed on Au, Al, Pt and W vs. Si02- Antiselective deposition was achieved on Pd seeded samples.

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Chemical Vapor Deposition of Assorted Metals

Cited by 3 publications

References 200 publications

Enhancements in the Electron-Transfer Kinetics of Uranium-Based Redox Couples Induced by Tetraketone Ligands with Potential Chelate Effect

Enhancements in the Electron-Transfer Kinetics of Uranium-Based Redox Couples Induced by Tetraketone Ligands with Potential Chelate Effect

Molybdenum Compounds without CO or Isonitrile Ligands

Investigation and Characterization of Thin Mocvd Copper Films From Pyrazolylborato - Copper (I) Complexes

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